Nanoimprint lithography over a non-flat surface has also been achieved. Finally, nanoimprint lithography has been successfully used for fabricating nanoscale photodetectors, silicon quantum-dot, quantum-wire, and ring transistors.Access through your organization Check access to the full text by signing ...
Fig. 2: Single skyrmion motion in a 100-nm-wide nanostripe stimulated by successive current pulses. aRepresentative snapshots of the current-induced motion of an individual skyrmion. The current density is\(j=8.47\times {10}^{10} \,{{{\mathrm{A}}} \cdot {{{\mathrm{m}}}^{-2}\)and...
SS symmetry Article The Effect of Deep N+ Well on Single-Event Transient in 65 nm Triple-Well NMOSFET Jizuo Zhang 1,2, Jianjun Chen 1,*, Pengcheng Huang 1, Shouping Li 1 and Liang Fang 1 1 College of Computer, National University of Defense Technology, Changsha 410073, Hunan, China;...
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At the heart of the M3 system is RoboSense’s 940nm laser emission solution, a technology under development since 2019 and already implemented in the E1 model. This advanced Vcsel dot matrix laser technology outperforms the 1550nm fiber laser in several key aspects. ...
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It should also be noted that the pattern definition can be greatly improved by the optimization of the resist exposure threshold and post-development conditions. Figure 3 AFM image of closely packed dots at 22-nm half pitch on the thermal resist. (a) the AFM image of four trains of dot ...
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