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(Nanomanufacturing and Metrology)期刊介绍 【主办单位天津大学信息】 Nanomanufacturing and Metrology(N&M)于2018年创刊,季刊,是纳米制造与计量领域第一本国际学术期刊,由教育部主管,天津大学、国际纳米制造学会(ISNM)和Springer-Nature出版集团共同主办。2017年,N & M入选由中国科协等六部委联合实施的“中国科技期刊国...
基本信息 期刊全称 Nanomanufacturing and Metrology 期刊简称 Print ISSN Online ISSN 期刊出版社 是否开放获取 Open Access,OA 暂无数据 官网地址 期刊所属领域 期刊简介 JCR分区索引信息2021年数据 是否是SCIE(SCI) 注:SCI已经完全被SCIE取代,参考:SCI被取代 ...
Nanomanufacturing and Metrology is a dedicated international forum for interdisciplinary research in manufacturing and metrology, which can be in micro, ...
【Nanomanufacturing and Metrology被Scopus数据库收录!】 Nanomanufacturing and Metrology(纳米制造与计量)在创刊两周年之际,被全球最大的同行评审文献摘要和引用数据库Scopus收录。(期刊主页,O网页链接)Nanomanufacturing and Metrology 是纳米制造与计量领域最早的国际性学术期刊之一,由国际纳米制造学会、天津大学和 Springer...
Nanomanufacturing and Metrology Aims and scope Submit manuscript Jingming Zhang, Yicheng Li, Kun Cao & Rong Chen 17k Accesses 77 Citations 10 Altmetric 1 Mention Explore all metrics Abstract Atomic layer deposition (ALD) is a thin-film fabrication technique that has great potential in ...
Nanomanufacturing and Metrology Aims and scope Submit manuscript Hao Wang, Ziyu Lu, Ziyang Huang, Yiming Li, Chaobo Zhang, Xiang Qian, Xiaohao Wang, Weihua Gui, Xiaojun Liang & Xinghui Li 397 Accesses Explore all metrics Abstract In fringe projection profilometry 3D measurement ...
[72,73] is specialized in the dimensional metrology of semiconductor devices. To avoid damaging the sample, electrons are accelerated at a low energy of < 1 keV, and fast and accurate stages for the semiconductor wafer are inserted in the CD-SEM instrument. The resolution of commonly ...
It has been proven to be an alternative approach to realize traceability in nanoscale dimension metrology [10,11,12]. Similarly, atom lithography has been demonstrated as a unique way to fabricate self-traceable pitch standards [13,14,15] and angle standards [16]. Atom lithography, or the so...
Nanomanufacturing and Metrology Aims and scope Submit manuscript Feng Gao, Yongjia Xu, Yanling Li, Wenbin Zhong, Yang Yu, Duo Li & Xiangqian Jiang 1070 Accesses Explore all metrics Abstract Accurately measuring the form of structured composite surfaces in situ is critical for advanced manufacturing...