Gioti, Mueller matrix spectroscopic ellipsometry: formulation and application, Thin Solid Films, 455-456 (2004) 43-49.Laskarakis, A., Logothetidis, S., Pavlopoulou, E., and Gioti, M., “Mueller matrix spectroscopic ellipsometry: formulation and application,” Thin Solid Films, Vol. 455-456...
Characterization of dielectric columnar thin films by variable angle Mueller matrix and spectroscopic ellipsometry. Opt. Mater. 29, 318-325.J. Gospodyn, J. Slit, Characterization of dielectric columnar thin film by vari- able angle Mueller matrix and spectroscopic ellipsometry, Optical Materials 29 (...
AutoSE: Spectroscopic Ellipsometer and Mueller Matrix Polarimeter Cathodoluminescence - CLUE Series CCD Camera - Syncerity CCD Deep Cooled Camera CLUE: Cathodoluminescence Solutions for Electron Microscopy Coatings and Thin Film Characterization – GD-Profiler 2™ ...
Snapshot ellipsometry. Check our prototype in a video Check out these videos showcasing our snapshot generalized ellipsometer (which measures eight elements of the normalized Mueller matrix). Additional details and explanations can be found in the video description. ...
The instrument is used to perform strain-induced birefringence imaging of crystalline silicon, and visualise the 3-D orientation of collagen fibres expressing linear retardance.The development of a spectroscopic Mueller matrix imaging microscope ellipsometer (MMI) is presented. Preliminary verification ...
The Mueller matrix is a mathematical description of how light is altered by an optical element or a sample under study. It describes both intensity (irradiance) and polarization changes, including a reduction of the total polarization. Mueller matrix spectroscopic ellipsometry has gained recent ...
Here, we first demonstrate the novel imaging Mueller-matrix spectroscopic ellipsometry (MMSE) technique, which can measure the overlay error of all cell blocks on a device wafer with extremely high throughput, much faster than conventional point-based spectroscopic ellipsometry (SE) technologies. It ...
Dixit, Dhairya J.Computer Science.Dhairya J Dixit., "Optical Metrology for Directed Self-assembly Patterning Using Mueller Matrix Spectroscopic Ellipsometry Based Scatterometry," Diss. STATE UNIVERSITY OF NEW YORK AT ALBANY, 2015
A multichannel ellipsometer in the dual rotating-compensator configuration has been designed and constructed for applications in real time Mueller matrix ellipsometry (approx. 2–5 eV) of anisotropic surfaces and films. The sequence of optical elements for this instrument is denoted PC1r(ω1)SC2r(ω...
Since Bi 2Te 3-like structure may be uniaxially anisotropic due to its rhombohedral crystallographic system, we investigated their optical behavior using ex and in situ Mueller matrix spectroscopic ellipsometry in the wavelength range of 470 to 830nm (1.5–2.6eV). We found that room-temperature ...