Micro And Nano Engineering期刊中文名:微纳米工程ISSN:2590-0072该杂志国际简称:Micro and Nano Engineering,是由出版商Elsevier出版的一本致力于发布--研究新成果的的专业学术期刊。主要发表刊登有创见的学术论文文章、行业最新科研成果,扼要报道阶段性研究成果和重要研究工作的最新进展,选载对学科发展起指导作用的综述...
《微纳米工程》(Micro And Nano Engineering)是一本以Engineering-Electrical and Electronic Engineering综合研究为特色的国际期刊。该刊由Elsevier出版商该刊已被国际重要权威数据库SCIE收录。期刊聚焦Engineering-Electrical and Electronic Engineering领域的重点研究和前沿进展,及时刊载和报道该领域的研究成果,致力于成为该领...
Micro and Nano Engineering (MNE) is an open access, multidisciplinary journal which crosses boundaries from nano to micro to bio, and from science to technologies. The journal focuses on micro-/nano engineering, fabrication and integration of functional nanostructures and … ...
期刊名缩写:MICRO NANO LETT期刊ISSN:1750-0443E-ISSN:1750-04432024年影响因子/JCR分区:1.5/Q4学科与分区:MATERIALS SCIENCE, MULTIDISCIPLINARY - SCIE(Q4); NANOSCIENCE & NANOTECHNOLOGY - SCIE(Q4)出版国家或地区:ENGLAND出版周期:Quarterly出版年份:2006年...
2021 Micro and Nano Engineering青年研究者奖开放申请! MNE青年研究者奖致力于表彰活跃在生命科学、物理、化学、环境科学、纳米制造和纳米技术领域的年轻研究人员。 MNE是一本涵盖多学科领域的开放获取期刊,现已被Scopus, ESCI,DOAJ数据库收录。该期刊侧重于微/纳米工程、功能纳米结构及表面的制造集成以实现智能纳米制造...
Micro- and Nano-Engineering (MNE) 2011, selected contributions: Part I19-23 September 2011 • Berlin Edited by Prof Dieter Kern Prof Johann-Peter Reithmaier Dr Olaf Krüger Dr Uwe Zeitner Prof Martin Hoffmann Dr Martin Stelzle Volume 97, Pages 1-410 (September 2012) ...
The MNE conference is the flagship event of the International Society for Micro- and Nanotechnology (iMNEs). It has always been the leading international c. Micro & Nano Engineering (MNE) 2025 is held in TBD, TBD, 2025/9 in TBD.
Micro and Nano Engineering (MNE) is the flagship event of the international Micro and Nano Engineering society (iMNEs) and the premium international conference on:micro/nanofabrication and manufacturing techniquesapplication of micro/nanostructures, devices and microsystems into electronics, photonics, ...
Charged particle nanopatterning techniques based on electron and ion multibeam projection techniques are finding increased industrial interest for the fabrication of leading-edge complex masks, nanoimprint templates, and,-using maskless and resistless techniques,-for nanosystem device research and development...