An application of matrix MEEF theory is shown to be iterative feedback techniques for model-based OPC.Nick CobbYuri GranikAnnual BACUS symposium on photomask technologyYuri Granik and Nicolas B. Cobb. MEEF as a matrix. In Photomask, pages 980-991, 2002....
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Application of the technique to analyze full-fieldpixel-based two dimensional (2D) MEEF color maps of several different design clips is explained. Process window (PW) is the most important metric in lithography simulations for evaluating the performance of a givenRET solution. Traditionally, process...