The meaning of PHOTOMASK is a pattern of opaque material used to shield selected areas of a surface (as of a semiconductor) in deposition or etching (as in producing an integrated circuit) : mask.
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The photolithography is the most critical step for the IC fabrication, among which the photomask and photoresist are the necessary materials. The photomask is commonly used as the printing master plate on the photolithography process. The mask pattern ca
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not available for EP0068012of corresponding document: US4361643 A photomask (30) used to form patterns on a resist coated semiconductor wafer is comprised of a transparent baseplate (31) having a thin metallic pattern (32) thereon; a transparent, planar coverplate (33) in intimate contact with...
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Disclosed are a photomask material for preparing a photomask having excellent heat resistance, ultraviolet resistance and image strength, a photomask having the above properties and methods for the production thereof, and the present invention provides a photomask material, which comprises a glass subs...