Marra, " Ultraclean Marangoni Drying, " Particles in Gases and Liquids 3: Detection, Characterization, and Control, 1993, pp. 269-282, Plenum Press, New York.J. Marra, Ultra Clean Marangoni Drying , pp. 269 282 1993.J. Marra, Ultra Clean Marangoni Drying , pp. 269 282 no date....
必应词典为您提供marangoni-drying的释义,网络释义: 马兰葛尼乾燥;马兰葛尼干燥;
In a new drying process (referred to as Marangoni drying), the substrate to be dried is withdrawn from a rinse bath (water) while at the same time nitrogen gas with a trace of an organic vapor is led along its surface. The organic vapor dissolves into water and introduces a surface tens...
The flow velocities vary enormously, from only 5 microns/sec for a drying water droplet to 1 mm/sec for ethanol/water mixtures. The sources of these varations in flow direction and speed will be discussed, including the effects of the contact angle, and of thermal and solutal Marangoni ...
wafer as the wafer is lifted out of the chamber, and a second spray bar adapted to direct a vapor to the meniscus, the vapor being adapted to lower a surface tension of the liquid at the meniscus to thereby perform Marangoni drying of the wafer as the wafer is lifted out of the ...
Particle performance; Residue-fee drying; Absence of wafer stress; Low alcohol consumption; Applications of the drying technique to 300-mm wafers.WolkeKlausEitelBarbelEBSCO_AspSolid State TechnologyWolke K,Eitel B,Schenkl M,et al.MARANGONI wafer drying avoids disadvantages.Solid State Technology. 1996...
wafer as the wafer is lifted out of the chamber, and a second spray bar adapted to direct a vapor to the meniscus, the vapor being adapted to lower a surface tension of the liquid at the meniscus to thereby perform Marangoni drying of the wafer as the wafer is lifted out of the ...
dryingwetnaturallyevaporatedsolventvaporsurfaceA surface tension gradient driven flow (a Marangoni flow) is used to remove the thin film of water remaining on the surface of an object following rinsing. The process passively introduces by natural evaporation and diffusion of minute amounts of alcohol ...
PURPOSE: A MARANGONI-type dry system for drying a wafer is provided to well-dry the wafer using a suitable quantity of isopropyl alcohol(IPA) vapor, by uniformly spraying the IPA vapor on the surface of the wafer. CONSTITUTION: An MARANGONI-type dry system for drying a wafer(212) comprises...
A method and apparatus for Marangoni substrate drying is disclosed which includes an adjustable spray bar assembly having mounting brackets coupled to a support structure of a drying system, a base assembly coupled to the mounting brackets and disposed parallel to a face of the support structure, ...