PURPOSE:To obtain a photoresist having superior resolving power and developability and leaving no residue after development by specifying the dimer content of alkali-soluble novolak resin in a compsn. consisting of an azidoquinone compd. and the novolak resin. CONSTITUTION:A alkali-soluble novolak res...
Production manner and its product null of evaporation huotorejisuto of anionic polymerization possible monomaA method for applying a polymeric resist coating of very high molecular weight to a suitable substrate without the necessity of elaborate purification steps and for ensuring adequate coverage of ...