Pool and Spa D. Filter Include Manifold top, air bleed, complete gird assembly and Grid Locator Spider. Effectively solve the problem of higher pump pressure caused by the blockage of the filter. Cleanable Complete Element Grid Assembly, please clean it in time. Easy installation, help to s...
New highly hydrophobic fluorinated oligoamides were synthesized and studied as materials for the protection of non-varnishable wooden artifacts. The new oligoamides were designed to achieve the best performance (including high chemical affinity to the wo
In results at one week, when we used non-thermal low-pressure argon plasma (NTLP-ArP) on a mechanized surface, the BIC% was improved; on the other hand, on RBM surfaces we did not obtain an improvement. However, these differences had no statistically significant difference. ...
CleaningDielectricPorousILDIt has been pointed out that, when low-K films for intermediate layer dielectrics (ILD) are used in BEOL processes, cleaning for residue removal (polymer removal) after etching, resist stripping, and ashing causes the dielectric constant K value to rise. We have ...
When employees have low dust shell surface caused by dirty after a good stickers stickers stickers every time Alice. 翻译结果2复制译文编辑译文朗读译文返回顶部 Staff operations low shell surface cleaning dust caused after your paste stickers across the time warp. ...
a员工反映玻璃清洁剂浓度偏高,在现场测试后在确保效果的前提下已酌情调低浓度 The staff reflected the glass cleaner density is high, in guarantees the effect after the scene test under the premise to use judgment to lower the density [translate] ...
Victory for Metro Cleaning Staff after Strike over Low PayByline: Sarah Scott Reporter sarah.scott@ncjmedia.co.uk
We present a study regarding the low-pressure RF plasma cleaning of carbon contaminated B4C test samples via inductively coupled O2/Ar, H2/Ar, and pure O2 RF plasma produced following previous studies using the same IBSS GV10x downstream plasma source. Results regarding the chemistry, morphology ...
Fuchs P, Marti K and Russi S 2012 Materials for mass standards: long-term stability of PtIr and Au after hydrogen and oxygen low-pressure plasma cleaning Metrologia 49 615-27P. Fuchs, K. Marti , S. Russi. "Materials for mass standards: long- term stability of Pt/Ir and Au after ...
A1.EtchingA3.Chemical vapor deposition processesWe studied the influence of plasma etching damage on epitaxial Si growth using ultrahigh vacuum chemical vapor deposition. The damaged layer induced on substrate surface had an amorphous structure that had some carbon, oxygen, and fluorine in its ...