This process is used in the fabrication of all computer chips as well as many other sophisticated devices.;In this thesis I discuss both the top-down and bottom-up approach to the fabrication of materials with dimensions on the nanometer length scale as well as progress towards the combining ...
that pattern is then transferred to another functional layer through a traditional etching or lift-off process.1Lithography facilitates the drive for ever-decreasing dimensions of semiconductor devices and is therefore a keystone of the nanotechnology revolution. Resist-based lithography is the most preval...
Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides ...
Step-and-repeat process for thermal nanoimprint lithography We present a step-and-repeat process for thermal nanoimprint lithography. For the selective heating and imprinting, a spin-coated polystyrene layer is expo... H Yoon,HS Cho,KY Suh,... - 《Nanotechnology》 被引量: 27发表: 2010年 加载...
In ice lithography, the entire process is greatly simplified since the resist coating system (water vapor nozzle) and metal deposition system are combined with the exposure system, indicating that the sample is never removed from the instrument. Moreover, e-beams in ice lithography are applied to...
In this work, we introduce a new lithography technique that we call Electrolithography. For developing this process, we exploit as well as significantly extend our previously reported16,17 understanding of controlled nanoscale material transport and pattern formation due to liquid electromigration in thin...
integrated part of the overall nanoimprint patterning process. In a sense, the residual layer etch is similar to the develop process in conventional lithography. It has been proposed to combine photolithography and nanoimprint lithography techniques in one step in order to eliminate the residual layer...
The selection was justified by the fact that NIL can bridge the gap between lab level nanotechnology research and production level manufacturing requirements. In this chapter, we briefly review the state-of-the-art lithography methods and introduce nanoimprint lithography (NIL), a very cost ...
Practical/ electron beam lithography nanotechnology/ tri-layer systems nanoimprint lithography improved process latitude hot embossing sequential reactive ion etching top layer image large thickness contrast high aspect ratio pattern-transfer techniques lift-off reactive ion etching electrodeposition 10 nm/ B255...
In the past decade, the feature size in ultra large-scale integration (ULSI) has been continuously decreasing, leading to nanostructure fabrication. Nowada... AE Grigorescu,CW Hagen - 《Nanotechnology》 被引量: 313发表: 2009年 Fabrication and characterization of platinum nanocrystalline material grown...