Bonnet J et al.The kelvin probe method for work function topographies: technical problems and solu-tions. Vacuum . 1984Bonnet J et al.The kelvin probe method for work function topographies: technical problems and solu-tions. Vacuum . 1984...
Work function of colloidal semiconducting nanocrystals measured by Kelvin probeWork function of colloidal semiconducting nanocrystals measured by Kelvin probeExperimental/ cadmium compoundscolloidal crystalscopper compoundsII-VI semiconductorslead compoundsliquid...
scanning probe microscopysurface contaminationsurface topographywork function/ work function dependencefilm thicknessAl substratecarbon contamination layersThe contact potential difference (CPD) between carbon contamination (CC) layers and the several substrates on which they were deposited has been measured as ...
This article describes a miniaturized Kelvin probe with a lateral resolution of 40 μm. Applied to a conducting or semiconducting surface, it allows a microscopic imaging of the difference of the work functions between the Kelvin probe and a sample. The signal resolution is better than 6 mV wit...
The work function of doped polyaniline nanoparticles observed by Kelvin probe force microscopy The work function of polyaniline nanoparticles in the emeraldine base state was determined by Kelvin probe force microscopy to be ~270 meV higher than that of similar nanoparticles in the emeraldine salt state...
Using the vibrating capacitor Kelvin probe technique, we have determined the contact potential difference (CPD) between a reference electrode and various metals acting as charge carrier injecting contacts in organic light-emitting devices (OLEDs). These investigations show that the work function of anod...
toTo开尔文theWorkprobe开尔文探Probehighwork 系统标签: kelvinprobeworkbaikieresolution探针 ©Prof. Iain Baikie 2009 IntroductiontotheKelvinProbe forHighResolutionWorkFunction Measurements Tuesday 1 Dec 2009 MRS Exhibit Hall Prof.IainD.Baikie CEO Profile ‐Iain Baikie PhD 1982‐88 UnivTwente(The Netherlands...
The Kelvin probe is a non-contact, non-destructive vibrating capacitor device used to measure the work function (wf) of conducting materials or surface potential (sp) of semiconductor or insulating surfaces. The wf of a surface is typically defined by the topmost 1 – 3 layers of atoms or ...
开尔文探针扫描系统(Kelvin Probe) 详细内容 我们的开尔文探针系统包括: □ 单点开尔文探针(大气环境及气氛控制环境); □ 扫描开尔文探针(大气环境及气氛控制环境); □ 超真空(UHV)开尔文探针; □ 湿度控制的腐蚀开尔文探针; 扫描开尔文探针系统配置 这是一款可以被大多数客户所接收的扫描开尔文探针系统,它是在ASKP...
The work function of commercially available indium tin oxide (ITO) films on glass substrates was measured using photoemission spectroscopy (PES) and ultra-high vacuum (UHV) Kelvin probe in direct comparison. Absolute Kelvin probe work function values were determined via calibration of the measured co...