如果薄膜中金属网格图样的线宽能够大幅度下降,则能有效的降低金属网格技术中的莫瑞干涉的问题,特别是如果金属网格图样的线宽下降到1um左右,则该技术制成的薄膜同样可以搭载在高分辨率的智能设备上。目前韩国三星公司利用微细线宽和图样化(Patterning)技术,将金属网格图样的线宽由原来的5um~6um,缩减到3um左右。然而,欲...
ITO PATTERNING METHODPROBLEM TO BE SOLVED: To make it possible to perform highly minute ITO patterning, by performing a plasma treatment by using the gas containing inert gas before an etching process for the ITO and patterned resist.TOYODA MOTOHIRO豊田 基博...
ITO资料
3D patterning/etching, 3D metallization, multi-layer circuits, HTCC—- Customized 3D packaging service Beside traditional flat plane patterning, Walthy is experienced of 3D surface metallization and patterning on diversified substrates, the complete facilities, process and engineering experience helps many ...
ITO patterning of the substrate as per ordered designs. The laser and wet etching use for the details patterning develop by Photolithography method. The direct soldering is not possible over an ITO thin film, hence there is a use of conductive paste, conductive ink or copper foil conductive ...
Of the various transparent conductive oxides (TCOs), ITO is considered the premium TCO, having superior conductivity and transparency, stability and ease of patterning to form transparent circuitry. ITO is used in a number of display technologies, such as LCD, OLED, plasma, electroluminescent, and...
cleaning solvent is isopropyl alcohol. This solvent should not injure the ITO coating but with prolonged contact, it could start to dissolve a bus-bar if present. Under no circumstances should you try cleaning with alkali solutions. Dilute sodium hydroxide solutions are commonly used for patterning...
ITOPatterning(Photo-etching) Byacidsolution Bybasesolution TCO-- ZnO • (Low-E) …. IZO R e s i s t i v i t y ( Ω . c m ) ZnO/(In2O3+ZnO)ratio 350ºC ●RT 1.ITO 2.TCO 3.TCO 4.TCO 5.TCO Section2 TCO
Method of patterning an ITO layerA method of patterning an indium tin oxide (ITO) layer is performed on a glass substrate. First, using sputtering, an amorphous ITO layer is deposited on the glass substrate. Then, using excimer laser annealing (ELA), the amorphous ITO layer within a ...
ITO Cr Co ZnO 序曲I* 231m【7 三 MJ r.Oj CONlfcVriwt.%) AZO:Cr ITO depositionbase solutionPR Stripping ITO deposition base solution PR Stripping H O Patterning (Photo-etchin 負:Photo-Resist 1 coaitin^ II 二 Photo-mask ExpoMirc ZnO系透明導電膜 ZnO系透明導電膜 TCO? ?主要應用:太陽...