离子束沉积,Ion beam... ... ) ion beam enhanced deposition 离子束增强沉积 ) ion beam sputtering deposition 离子束溅射沉积 ... www.dictall.com|基于8个网页 2. 离子镀 PVD包括热蒸发(Thermal Evaporation Deposition)、溅射(Plasma Sputtering Deposition)和离子镀(Ion Beam Sputtering…blog.sina.com.cn...
Ion beam sputtering-depositedHigh temperature annealingIn this article, we focus on the effect of high-temperature annealing (HTA) on ion beam-sputtered hexagonal boron nitride (h-BN)/sapphire samples with different thicknesses. Using atomic force microscopy (AFM), Fourier transform infrared (FTIR)...
2) ion beam sputtering deposition 离子束溅射沉积 1. Diamond-like carbon films(DLC films) were prepared by ion beam sputtering deposition and the effects of the bias on the properties of the films were studied. 采用离子束溅射沉积镀膜法制备了DLC薄膜,研究了偏压对薄膜性能的影响。 更多例句>> ...
3) Dual ion beam sputtering deposition 双离子束溅射沉积 1. Cr-doped SiC films were fabricated on Si and KBr substrates by using dual ion beam sputtering deposition with Cr-metal pasted on a high-purity SiC sintered target. 利用高纯SiC烧结靶上粘贴金属Cr片的复合靶用双离子束溅射沉积方法,在...
1. 离子束溅镀 离子束溅镀(Ion-beam sputtering)离子辅助沈积(Ion-assisted deposition) 反应式溅镀(Reactive sputtering) 高功率脉冲 … www.junsun.com.tw|基于9个网页 2. 离子束溅射 离子溅射,ion... ... ) ion sputtering 离子溅射 )ion-beam sputtering离子束溅射) ion-beam sputter 离子束溅射 ......
The films are deposited on various substrates such as Ti, Si, SUS and quartz using an argon ion beam for sputtering and an oxygen ion beam for producing the mixing effect and control of the stoichiometry of the oxides. The deposition rate was about 0.07 nm s-1 and the oxygen beam ...
Ion Beam Deposition (IBD) is one of three ways of depositing thin-film using Ion Beam Sputtering: IBD, RIBD and IBAD. Reactive Ion Beam Deposition (RIBD): Reactive gases, such as N2 or O2 , are injected inside the chamber while the film is being deposited to adjust the stoichiometry ...
层Ge量子点.具体参数如下:1)在700。C下生 长Ge沉积量为2nm的单层(样品编号A)和双层 样品,其中双层样品中Si隔离层厚度分别为16nm, 32nm和48nm(对应样品B—.D);2)在700。C下生 长Ge沉积量为1.6nm的单层(样品E)和双层样 品(样品F),其中双层样品中隔离层厚度为48nm; 3)在650。C下生长Ge沉积量为2nm的...
ECIproduces thin-film coatings using a variety of different deposition methods, our most advanced deposition method is Ion Beam Sputtering (IBS). Ion Beam Sputtering produces coatings that are very dense with low surface roughness. Another advantage of IBS thin-film coatings is that they exhibit su...
ion beam sputteringmechanical propertiesoptical propertiesSrTiO_3SrTiO3 (STO) thin films have been deposited on glass substrates by electron cyclotron resonance (ECR) ion beam sputter deposition at different substrate temperatures (100600°C). The structural characteristics of the deposited films show a...