An apparatus for depositing an oxide thin film using sputtering and ion beam deposition includes a metal target (made of Nb or Si) installed on the wall of a chamber, an ion source gun for improving properties of an optical thin film, and a substrate installed on a drum jig in the ...
2) ion beam sputtering deposition 离子束溅射沉积 1. Diamond-like carbon films(DLC films) were prepared by ion beam sputtering deposition and the effects of the bias on the properties of the films were studied. 采用离子束溅射沉积镀膜法制备了DLC薄膜,研究了偏压对薄膜性能的影响。 更多例句>> ...
离子束沉积,Ion beam... ... ) ion beam enhanced deposition 离子束增强沉积 ) ion beam sputtering deposition 离子束溅射沉积 ... www.dictall.com|基于8个网页 2. 离子镀 PVD包括热蒸发(Thermal Evaporation Deposition)、溅射(Plasma Sputtering Deposition)和离子镀(Ion Beam Sputtering…blog.sina.com.cn...
Ion beam assisted deposition (IBAD) is a coating technique which combines the condensation of a material and ion bombardment. Ion bombardment strongly affects not only the features of the growing film such as composition or microstructure but it also leads via re-sputtering processes to a loss of...
Simultaneous ion beam bombarding during film growth caused defluorination and structural changes. Mechanism for sputtering deposition of such a polymeric material is also discussed. 展开 关键词: Experimental/ infrared spectra ion beam effects polymer films polymer structure sputter deposition X-ray chemical...
(t) is the beam current density of HFIB. The second term is the leakage current term, wherekis the conductivity of the substrate,\({\epsilon }_{r}\)is the substrate relative permittivity, and\({\epsilon }_{0}\)is the vacuum permittivity constant. The third term is the sputtering ...
The emerging technology of High Power Impulse Magnetron Sputtering (HIPIMS) has much in common with the more established technology of Plasma-Based Ion Implantation & Deposition (PBIID): both use pulsed plasmas, the pulsed sheath periodically evolves and collapses, the plasma-sheath system interacts ...
A graphene nanodots-encaged porous gold electrode via ion beam sputtering deposition (IBSD) for electrochemical sensing is presented. The electrodes were fabricated using Au target, and a composite target of Al and graphene, which were simultaneously sputtered onto glass substrates by Ar ion beam, ...
The Ag(100) single-crystal substrate (Mateck, 99.999%) was cleaned by several cycles of sputtering and annealing, then deposited with the NaCl film by thermal evaporation of the NaCl source (Sigma Aldrich, 99.999%). During the deposition process, the substrate temperature was maintained between ...
The quantum-dot samples with single Ge layer and twofold stacked Ge layers are prepared by ion beam sputtering deposition. The different sizes and morphologies of quantum-dots are characterized using atomic force microscope technique. The effects of strain from the capped Ge quantum-dots on the upp...