The electrical property of a material that lies betweeninsulatoras well asconductoris known as a semiconductor material. The best examples of semiconductors are Si and Ge. Semiconductors are classified into two type’s namely intrinsic semiconductor and extrinsic semiconductor (P-type and N-type). T...
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doi:US6404039 B1Hidenori FujiiUSUS6404039 1998年12月7日 2002年6月11日 Mitsubishi Denki Kabushiki Kaisha Semiconductor device with intrinsic base diffusion layer, extrinsic base diffusion layer, and common base diffusion
The dielectric landing pad is removed and a semiconductor layer is grown epitaxially on exposed monocrystalline surfaces of the extrinsic and intrinsic base layers, thereby forming the entirely monocrystalline intrinsic base to extrinsic base link-up region. 展开 ...
Extrinsic Semiconductor: The electrical characteristics of an intrinsic semiconductor are not that beneficial. The characteristics can be changed by introducing some impurities in the intrinsic semiconductor like pentavalent and trivalent elements, then those material is called extrinsic semiconductor material. ...
Method of making a semiconductor including forming graft/extrinsic and intrinsic base regionsAn impurity-doped region that serves as an intrinsic base region of a bipolar transistor is formed in a very early stage, and an electrode for taking out the base and a graft base region are formed in...
Subsequently, an opening is formed through the extrinsic base layer to the dielectric landing pad and the dielectric landing pad is selectively removed, thereby exposing monocrystalline surfaces only of the intrinsic and extrinsic base layers. A semiconductor layer is then formed by epitaxial deposition...
Subsequently, an opening is formed through the extrinsic base layer to the dielectric landing pad and the dielectric landing pad is selectively removed, thereby exposing monocrystalline surfaces only of the intrinsic and extrinsic base layers. A semiconductor layer is then formed by epitaxial deposition...
Subsequently, an opening is formed through the extrinsic base layer to the dielectric landing pad and the dielectric landing pad is selectively removed, thereby exposing monocrystalline surfaces only of the intrinsic and extrinsic base layers. A semiconductor layer is then formed by epitaxial deposition...
Upper and lower insulating layers (194,192) having opening in center region, are respectively provided between upper extrinsic semiconductor layer and intrinsic semiconductor layer and intrinsic semiconductor layer and lower extrinsic semiconductor layer, so that photoelectric current output due to ...