InProcess-LSP, headquartered in Oss at Pivot Park, is a rapidly growing, innovative company founded in 2014. Backed by a team of in-house experts—comprising physicists, chemists, and software engineers—InProcess-LSP is at the forefront of nanotechnology solutions. The company’s leading product...
Development of a compounded propofol nanoemulsion using multiple non-invasive process analytical technologies – T. Rooimans et al. Liposome manufacturing under continuous flow conditions: towards a fully integrated set-up with in-line control of critical quality attributes – M. Sheybanifard et al....
An analysis of a start-up process in LSPMSMs with aluminum and copper rotor bars considering the coupling of electromagnetic and thermal phenomenadoi:10.24425/AEE.2019.130693Mariusz BaranskiWojciech SzelagWieslaw LyskawinskiPolish Academy of Sciences...
32. The Role of LSP in the Lifelong Learning Process and in Professional Success of Croatian Lawyers. 来自 bib.irb.hr 喜欢 0 阅读量: 24 作者: Ljubica Kordić 摘要: Foreign languages for specific purposes (FLSP), primarily English (ESP) and German (GSP), occupy different positions and ...
Hongmin G and Xiangjie Y, Morphology evolution of primary particles in LSPSF rheocasting process. International Journal of Modern Physics B (2009), 23, 881-887.GUO H M,YANG XJ.Morphology evolution of pri mary particles in LSPSF rheocasting process.International Journal of Modern Physics. 2009...
Hongmin G and Xiangjie Y, Morphology evolution of primary particles in LSPSF rheocasting process. International Journal of Modern Physics B (2009), 23, 881-887.GUO H M,YANG XJ.Morphology evolution of pri mary particles in LSPSF rheocasting process.International Journal of Modern Physics. 2009...
Morphology Evolution of Primary Particles in LSPSF Rheocasting Process. Int. J. Mod. Phys. B 2009, 23, 881-887.GUO H M,YANG XJ.Morphology evolution of pri mary particles in LSPSF rheocasting process.International Journal of Modern Physics. 2009...
process for the in situ application of a ti \\/ tin containing metallsperrschichtA single chamber of a vapor deposition system is used to deposit both Ti and TiN. A Ti layer is deposited on the sample using a noncollimated process. N2 gas in then introduced in the chamber. A TiN ...
In-process wire cleaningRalph A VogelVogel, R. A. 1989. In-Process Wire Cleaning. Three Rivers, Mich., U.S. Patent No. 4,817,645.Vogel, Ralph A., "In-Process Wire Cleaning"; Three Rivers, Michigan, USA, 1989, US-Patent No. 4,817,645...
Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the processHerein disclosed is an exposure technology for a semiconductor integrated circuit device which has a pattern as fine as that of an exposure wavelength....