Our robust ICP-OES systems offer easy-to-use software and multi-element detection technology far superior to that of single-element AAS and multi-element microwave plasma techniques. They are ideal for laboratories with low sample through...
质谱仪(Inductively Coupled Plasma Mass Spectrometry,简称ICP-MS)是一种高灵敏度、高分辨率和高精确度的分析仪器,主要用于测定超痕量元素和同位素比值。以下是对该仪器的详细介绍: 一、组成结构 ICP-MS主要由以下几个部分组成: 等离子体发生器:产生高温等离子体,使样品中的原子被激发或电离。 雾化室:将溶液样品送入...
The sample solutions were analyzed with the inductively coupled plasma mass spectrometry (ICP-MS) technique after the microwave digestion system. Consequently, the highest concentration of Al used as pigment was found in the eye shadow, lipstick and nail polish samples for the 3 brands, while the...
Reduce your lab’s environmental impact with the iCAP MX Series ICP-MS and iSC-65 Autosampler, both recipients of the ACT label from My Green Lab. The ACT label, the standard for determining the environmental impact of laboratory products, helps labs make informed, sustainable ...
采用电感耦合等离子体质谱(ICP-MS)法,对紫菜中的微量元素砷进行了测定。 dictsearch.appspot.com 9. Method:Establishedmethodbasedonmicrowavesampledigestionandinductivelycoupledplasma-massspectrometer. 方法:采用微波消解的方法对样品进行处理,用电感耦合等离子体质谱仪进行测定。
ICPOES技术中,“ICP”代表什么? A. Inductively Coupled Plasma B. Inductively Coupled Plasma Emission C. Inductively Coupled Plasma Optical Emission Spectroscopy D. Inductively Coupled Plasma Optical E. mission Spectrometer 相关知识点: 试题来源: 解析 C ...
Inductively Coupled Plasma Mass Spectrometry (ICP- Introduction Drinking water must be “wholesome”, as defined in law by standards for a wide range of substances, organisms and properties of water. The standards are set to be protective of public health, while the definition of wholesome reflects...
Laser Ablation -Inductively Coupled Plasma -Mass Spectrometry 激光烧蚀-电感耦合等离子体质谱法 热度: I INDUCTIVELYCOUPLEDPLASMA-MASS SPECTROMETRY(ICP-MS) HectorNeff DepartmentofAnthropologyandIIRMES,California StateUniversityLongBeach,LongBeach,CA,USA
a high-voltage spark ionizes some of the argon. This causes a chain reaction within the magnetic field, breaking down the argon gas to contain argon gas, argon ions, and electrons. This is an inductively coupled plasma. The viewing area for ICP emission work is somewhere between the 6500C...
Inductively Coupled Plasma – Chemical Vapor Deposition (ICP-CVD) is the method of choice for deposition of Si-based materials at low substrate temperatures, typically below 150°C. ICP-CVD technology ICP CVD uses a high-density inductively coupled plasma source which operates in the low pressure...