Hitachi High-Tech Launches the GT2000, High-Precision Electron Beam Metrology System to Meet the Needs of Semiconductor Devices Development and Mass Production in the High-NA EUV Generation LEARN MORE SERIALS The World through an Electron Microscope Part 6 ...
Hitachi High-Tech Manufacturing & Service Corp. Hitachi High-Tech Science Corporation Hitachi High-Tech Kyushu Corporation Giesecke & Devrient Kabushiki Kaisha Chorus Call Asia Corporation NeU Corporation e-Associates Inc. Korea Hitachi High-Tech Korea Co.,Ltd. (한국어) ...
In this experiment, a water quality test kit (No.31 LR-Cr6+) using 1,5-diphenylcarbazide was used, which employs absorption spectrometry (KYORITSU CHEMICALCHECK Lab., Corp). Model: U-1900 UV-VIS82 MEASUREMENT OF SMALL QUANTITIES OF DNA SAMPLES USING A 1µL CELL Model: U-1900 Keywords...
Hitachi High-Tech Corp.Request InfoThe DI2800 Dark Field Wafer Defect Inspection System from Hitachi High-Tech Corp. is a high-speed metrology system designed to identify defects and particles on patterned wafers up to 8 in. in diameter. With its high throughput and performance, the DI2800 ...
Hitachi High-Tech Corp. Science and Medical Systems Business Group Science Systems Product Div. Applications Development Dept. *3 Ikuko Nakatani, Shota Torikawa Hitachi High-Tech Science Corp. Beam Technology Application Engineering Group Beam Technology Systems Design Department...
Filing Date: 09/03/2009 Export Citation: Click for automatic bibliography generation Assignee: HITACHI HIGH TECH CORP (JP) SUZUKI KOUICHI (JP) SUZUKI NOBUO (JP) NOMURA SEIJI (JP) OISHI TADASHI (JP) SETOMARU TAKESHI (JP) International Classes: ...
Eine Aufgabe der vorliegenden Erfindung besteht darin, eine Systemkonfiguration bereitzustellen, die in der Lage ist, den Durchsatz und die Funktion einer genetischen Testvorrichtung leicht zu erweitern. Es ist ein genetisches Testsystem vorgesehen, das mit einer Abgabeeinrichtung zur Abgabe eine...
Filing Date: 02/24/2021 Export Citation: Click for automatic bibliography generation Assignee: HITACHI HIGH TECH CORP (Tokyo, JP) International Classes: G01N35/00G06F17/00 Attorney, Agent or Firm: MERH-IP Matias Erny Reichl Hoffmann Patentanwälte PartG mbB (München, DE) ...
KUSANO KAZUMI (JP) Application Number: DE60316095A Publication Date: 10/18/2007 Filing Date: 11/10/2003 Export Citation: Click for automatic bibliography generation Assignee: HITACHI HIGH TECH CORP (JP) International Classes: G01F23/00G01N35/10G01N35/00...
Filing Date: 03/18/2016 Export Citation: Click for automatic bibliography generation Assignee: HITACHI HIGH TECH CORP (Tokyo, JP) International Classes: G01N23/04G01N1/28G01N23/225H01J37/20 Attorney, Agent or Firm: MERH-IP Matias Erny Reichl Hoffmann Patentanwälte PartG mbB (München, ...