The growth kinetics of Hf silicate-like films, prepared using and precursors and as an oxidant were investigated as a function of alternating deposition of and . The ratio of the alternate deposition of and affected the growth behavior of Hf silicate-like films, but the thickness of the films...
We performed a first principles study to investigate the interaction of tetrakis-ethylmethylaminohafnium (4[(C2H5)(CH3)N]Hf, TEMAHf) precursors with an OH-terminated Si (001) surface that is the initial stage of atomic layer deposition (ALD). When TEMAHf reacted on the OH-terminated Si sur...
例子 CH4ON2 LiHS Mg3(AsO4)2 SnBr2 CrO4P BaCl2 Al Br4Th (HCOO){-} C2H5CH(OH)CH3 HC2H3O C3H7COOH Recent Oxidation Numbers
CH3COOCH3 + KOH = H2O + C2H5COOK C2H4O + AgNO3 + NH3 + H2O = C2H7O2N + NH4NO3 + Ag N2O + KMnO4 + H2O = NO + MnO2 + KOH Recently Balanced EquationsBalance NH4Cl + HF = NH4F + HCl Using the Algebraic Method Step 1: Label Each Compound With a Variable Label each compound (reac...
The Hf–Sc–O films are synthesized by atomic layer deposition using hafnium tetrakis-diethylamide (Hf(N(C2H5)2)4, TDEAH), scandium tris-methylcyclopentadienyl (Sc(C5H4CH3)3), and water at 300 °C on (100) single crystal silicon wafers from SiOх oriented microrope arrays (OMRA). ...
Hf(N(CH3)(C2H5))4 was used for HfO2 layer, and bis(dimethylamino)silane [BDMAS: SiH 2(N(CH3)2)2] or tris(dimethylamino)silane [TDMAS: SiH(N(CH3)2) 3] precursors were used for SiO2 layers, respectively. O3 was used as an oxidant. The thickness of SiO2 deposited using ALD ...
Structure of heteroassociates formed in the HF-(C2H5)2O liquid systemdoi:10.1007/s10947-010-0010-6binaryliquidsystem - IR... E.,G.,TarakanovaG.,... - 《Journal of Structural Chemistry》 被引量: 4发表: 2010年 Structure of heteroassociates formed in the HF-(CH3)2CO binary liquid system...
C.还原性:HF>H2O>NH3 D.沸点:C2H5OH<C2H5SH 免费查看参考答案及解析 题目: 下列说法正确的有( )①稳定性:HF>H2O>NH3 ②离子半径:Na+>Mg2+>F- ③电子数:CH4>CH3->-CH3 ④结合质子能力:OH->AlO2->HCO3- ⑤熔沸点:AsH3>PH3>NH3 ⑥分散系中分散质粒子的直径:Fe(OH)3悬浊液>Fe(OH)3胶体>FeCl3溶液...
氢键对物质物理性质的影响分子间氢键使物质的熔、沸点升高,如HF、H2O、NH3的沸点都反常的高,又如乙醇的沸点也比乙烷的沸点高出很多。此外,如NH3、C2H5OH、CH3
Draw and name the strongest intermolecular force between the following molecules a. CH3OH and H2O b. CH3F and H2O C. CH3F and CH3F Identify the types of intermolecular forces present in n-butane C 4 H 10 . For the molecule CBr4,...