An object is to provide acid-resistant, highly reliable phase shift masks, and phase shift mask blanks, wherewith high-precision patterning is possible.A halftone phase shift mask blank comprising a transparent substrate 10, a halftone material film 11 laminated on that transparent substrate, and...
The invention relates to a halftone phase shift photomask which is controlled with precision in terms of its transmittance at a wavelength applied to inspection, and measuring equipment, so that its q