1998. Fundamentals of Electrochemical Deposition. New York. John Wiley & Sons.Milan Paunovic; Schlesinger, M., Fundamentals of Electrochemical Deposition,. Second ed.; Wiley: USA, 2006.Paunovic M,Schlesinger M.Fundamentals of Electrochemical Deposition.Electrochemical Society Series. 1998...
Fundamentals of Electrochemical Deposition 电子书 读后感 评分☆☆☆ 评分☆☆☆ 评分☆☆☆ 评分☆☆☆ 评分☆☆☆ 类似图书 点击查看全场最低价 出版者:John Wiley & Sons Inc 作者:Paunovic, Milan/ Schlesinger, Mordechay 出品人: 页数:373 译者...
电镀基本原理(Fundamentalsofelectroplating) Fundamentalsofelectroplating Electroplatingisanelectrochemicalprocess,isalsoakind ofredoxprocess.Thebasicprocessofelectroplatingispart immersedinasolutionofmetalsaltsasmetalplateasanode, cathode,DCpowersupply,depositrequiredcoatingonthepart. ...
- 《Journal of the Electrochemical Society》 被引量: 208发表: 1967年 CVD glass films for passivation of silicon devices - Preparation, composition, and stress properties Results of studies are described for successful glass passivation, by chemical vapor deposition (CVD), of metallized silicon planar...
A new, sizable family of 2D transition metal carbonitrides, carbides, and nitrides known as MXenes has attracted a lot of attention in recent years. This is because MXenes exhibit a variety of intriguing physical, chemical, mechanical, and electrochemical characteristics that are closely linked to...
Single-atom alloys that consist of a catalytically active metal atomically dispersed in a less-catalytic metal host have recently attracted significant con
by means of electrochemical reactions. However, chemical plating is the more accurate term that can be used to denote the several means of metal deposition without the application of electric current from an external source. Hence, immersion deposition, as well as electroless deposition, covered in...
These carbon-based nanomaterials have been employed directly or combined with other materials as SPME coatings in all possible geometries (fiber, hollow fiber, thin-film, stir-bar, in-tube and in-needle SPME) prepared either by chemical bonding, physical deposition, electrochemical deposition, electro...
ElectrochromismThe electrochemical and color impedance behavior of thin (0.25 渭m) amorphous WO1 films was examined. In general, the two types of behavior... J.J.,Kim,D.A.,... - 《Journal of Electroanalytical Chemistry》 被引量: 53发表: 1997年 Chemical vapor deposition of tungsten oxide ...
The principles of the physical vapour deposition processes(PVC); evaporation, sputting, and ion plating are presented and compared with each other with respect to coating properties, deposition rate and process control. The significance of coating sources and vacuum equipment for hard materials coating...