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The at least one first shield device (350) is configured to be moveable at least between the first processing chamber (310) and the second processing chamber (320).ZILBAUER, Thomas WernerHELLMICH, AnkeHINTERSCHUSTER, ReinerMÜHLFELD, UweSTOCK, BernhardWOLF, Hans GeorgBENDER, Marcus...
An apparatus for depositing a material on a substrate (310) is described. The apparatus includes a vacuum chamber (300); a substrate receiving portion (305) in the vacuum chamber for receiving the substrate during deposition of the material; a target support (320) configured to hold a target...