The design, architecture and VLSI implementation of an image compression algorithm for high-frame rate, multi-view wireless endoscopy is presented. By operating directly on Bayer color filter array image the algorithm achieves both high overall energy efficiency and low implementation cost. It uses ...
CrossrefView in ScopusGoogle Scholar [8] Sanchez-Garrido J., Aparicio B., Ramírez J.G., Rodriguez R., Melara M., Cercós L., Ros E., Diaz J. Implementation of a time-sensitive networking (TSN) Ethernet bus for microlaunchers IEEE Trans. Aerosp. Electron. Syst., 57 (5) (2021),...
System and method to calculate video frame delay in a video stream received by a telecommunications endpoint, the method including: locating reference features characteristic of content in the receive
View Patent Images: Download PDF 5900582 US Patent References: Foreign References: Other References: Shukla et al., "A Critical Review Of VLSI Die-Attachment In High Reliability Applications", Solid State Technology, Jul. 1995, pp. 67-74. ...
Proposed is a frame-supported pellicle used for dustproof protection of a photomask in the photolithographic patterning work for the manufacture of electronic fine devices such as LSIs, VLSIs and the like by mounting thereon. The inventive frame-supported pellicle is characterized in that the ...
The present invention is made in view of such problems. The object of the present invention is to provide a pellicle frame which is less likely to not only be degraded by short-wavelength light, such as excimer light, but also outgas and generate foreign particles; a pellicle using the pell...
The present invention has been made in view of such circumstances, and an object of the present invention to provide: a pellicle frame with which in a case where a fine pattern of 10 nm or less is formed on a photoresist film by using an EUV exposure technique, a situation in which wri...
The present invention has been made in view of such circumstances, and an object of the present invention to provide: a pellicle frame with which in a case where a fine pattern of 10 nm or less is formed on a photoresist film by using an EUV exposure technique, a situation in which wri...
concern that a damage to the pellicle film may be caused. There is no problem in a case of slowly returning the pressure, and from the viewpoint of the workability, it has been found that there is a case where it may be required to return the pressure more quickly from a high vacuum...
VLSI Vision Ltd., Serial Interface Specification, VVL-1060, Apr. 1994, pp. 1-9. VVL1070 Engineering Evaluation Kit Specification, Sep. 27, 1994, V1.1, pp. 1-5. Apr. 18, 2011 Office Action in U.S. Appl. No. 12/906,728, filed Oct. 18, 2010. Aug. 11, 2011 Notice of Allo...