网络释义 1. 聚焦离子束光刻 电器电子词汇英语翻译(A-G) ... focused beam laser 聚焦束激光器focused ion beam lithography聚焦离子束光刻focusing 聚焦 ... www.zftrans.com|基于22个网页
J. Melngailis, “Focused ion beam lithography,” Nucl. Instrum. Methods Phys. Res. B 80, 1271–1280 (1993).Melngailis, J. (1993) Focused ion beam lithography. Nucl. Instrum. Methods Phys. Res. B 80/81: pp. 1271-1279J. Melngailis, Focused ion-beam lithography, Nucl. Instrum. ...
Focused Ion Beam Lithography - InTech - Open Science Open 聚焦离子束光刻技术-开放科学开放 热度: Dense Metal Plasma in a Solenoid for Ion Beam Neutralization(离子束中和的螺线管中的重金属等离子体) 热度: HEAVY-ION IN-BEAM SPECTROSCOPY(重离子束光谱) ...
FIB circuit edit is performed using a finely focused gallium (Ga+) ion beam with nanoscale resolution. It is possible to image etch and deposit materials on an IC with an extremely high level of precision. By removing and depositing materials, FIB circuit edit enables designers to cut and co...
Focused ion beam lithography (FIBL) is a resist-free process of directly writing nanoscale patterns on target substrates by focused ion beams with higher energy (Sobolev and Sanchez, 2012). From: Biosensors and Bioelectronics, 2019 About this pageSet alert ...
focused ion beam lithographykinoformsmicro-opticsX-ray microscopyA kinoform lens designed for X-ray point focusing, fabricated via grayscale ion-beam lithography, is shown by C. Gr茅vent and co-workers. A high-quality, continuous surface profile leads to almost 90% of the theoretical focusing ...
estimated USD 1.3 billion in 2023, at a CAGR of 7.0% from 2023 to 2028. The growth of the focused ion beam market can be attributed to requirement for ion beam lithography technology-integrated FIB systems and deployment of focused ion beam systems for applications in material science industry...
Micromachining using deep ion beam lithography In recent years the process combining deep X-ray lithography with electroforming and micromoulding (i.e. LIGA), has become an important technique for the p... SV Springham,T Osipowicz,JL Sanchez,... - 《Nuclear Instruments & Methods in Physics ...
Beam-induced deposition of different materials can be combined with FIB milling without the need for additional aligning lithography steps; patterns can be directly added to deposited structures or existing patterns can be modified. The final patterned substrates are immediately available for further ...
3) focused ion beam lithography 聚焦离子束光刻 4) ion beam etching 离子束刻蚀 1. Influence of fabrication error inion beam etchingon diffractive optical element; 离子束刻蚀工艺误差对DOE器件的影响 2. Fresnel lens fabricated byion beam etching; ...