网络释义 1. 聚焦离子束光刻 电器电子词汇英语翻译(A-G) ... focused beam laser 聚焦束激光器focused ion beam lithography聚焦离子束光刻focusing 聚焦 ... www.zftrans.com|基于22个网页
focused ion beamsion sourcessystem performanceion beam lithographyWe review the possible applications of focused ion beams to the lithography and doping stages in the fabrication of microelectronic devices. Topics discussed include ion sources, system performance, ion beam lithography and direct implantation...
Micromachining using deep ion beam lithography In recent years the process combining deep X-ray lithography with electroforming and micromoulding (i.e. LIGA), has become an important technique for the p... SV Springham,T Osipowicz,JL Sanchez,... - 《Nuclear Instruments & Methods in Physics ...
Focused ion beam lithography Focusedion beam(FIB) lithography is a maskless, direct-writing nano-structural technique, and it has been widely used in the semiconductor industry, materials science, and biological fields [27–32].FIButilizes a focused beam of ions (typically Ga+) to locally remove...
3) focused ion beam lithography 聚焦离子束光刻 4) ion beam etching 离子束刻蚀 1. Influence of fabrication error inion beam etchingon diffractive optical element; 离子束刻蚀工艺误差对DOE器件的影响 2. Fresnel lens fabricated byion beam etching; ...
focused ion beam lithographykinoformsmicro-opticsX-ray microscopyA kinoform lens designed for X-ray point focusing, fabricated via grayscale ion-beam lithography, is shown by C. Gr茅vent and co-workers. A high-quality, continuous surface profile leads to almost 90% of the theoretical focusing ...
Self-Development Properties of Nitrocellulose for Focused Ion Beam Lithography 来自 国家科技图书文献中心 喜欢 0 阅读量: 20 作者:H Kaneko,Y Yasuoka,K Gamo,S Namba 摘要: A method for obtaining the reproducibility of the self-developed pattern of nitrocellulose by monitoring the absorption current was...
In this work, focused ion beam (FIB) lithography was developed for plasma enhanced atomic layer deposited (PEALD) silicon dioxide SiOhard mask. The PEALD process greatly decreases the deposition temperature of the SiOhard mask. FIB Gaion implantation on the deposited SiOlayer increases the wet ...
Lithography limitations at 20nm often require a great deal of fixing to achieve signoff. Finally, designers face numerous chip and IP integration challenges, packaging issues, and additional complexity as these issues interact. Similar challenges face designers of power control ICs ...
网络释义 1. 自聚焦激光束 什么意思_英语focused_beam在线翻译... ...focused laser beam自聚焦激光束focused ion beam lithography 聚焦离子束光刻 ... dict.youdao.com|基于 1 个网页 释义: 全部,自聚焦激光束