FEP-171developmentFEP-171 resist is commonly used both together with 50 keV VSB and DUV laser mask writers. To improve resolution and other lithographic parameters, the industry has strived towards thinner resis
FEP-171swing curvedry etchchrome profileChrome and resist thickness are limiting factors for final resolution on mask. The trend in mask manufacturing is consequently moving towards thinner chrome and resist films. The Sigma7300 is a 248nm DUV laser pattern generator with optical resolution ...
FEP-171 is the positive chemically amplified resist (PCAR) that is most commonly used in advanced mask manufacturing with both 50 keV variable shaped e-beam (VSB) and DUV laser pattern generators. TF11 allows an FEP-171 resist film down to about 2000 A thickness with sufficient etch ...