Dielectric measurements have revealed that the device has a very high working frequency (up to -3.1 GHz), meaning that the device may have a higher sensitivity than the devices reported in the literature.doi:10.1088/0256-307X/22/3/048VIP中国物理快报(英文版)Fabrication and Characterization of ...
Please observe a linguistic ambiguity in the context of hardware modeling: Meaning of “sequential” with reference toSynonymAntonyms ○ program execution during simulation step-by-step concurrent, parallel ○ nature of circuit being modeled memorizing combinational, memoryless Show moreView chapter Book ...
Multi-layered microfluidic structures cut from pressure sensitive and thermal activated adhesive films can be cut and laminated in less than 30 minutes. This method of using a cutting plotter to prototype is called Xurography, for the Greek root words Xuron and graphe meaning razor and writing, ...
The new technology uses harmless chemicals and machines common in nanomanufacturing laboratories today, meaning that more researchers could now begin to study metasurfaces. “Our method could be a step toward large-scale production of metasurfaces,” said Ruggero Verre, a researcher at the Department...
One of the important concepts of the EBL process is a “chip” (or “write window”) meaning an area where an electron beam can scan without any stage movement. Only the current in the electromagnetic lens changes for scanning the area in a single chip. In the case of several chips, ...
A noted semiconductor business analyst—Ming-Chi Kuo—reckons that recent 2 nm pilot yields have progressed well over the 60% mark, meaning that the involved foundry teams are more than ready to move onto kicking things into high gear. Taiwan's Economic News Daily anticipates significant financi...
Droplet controllable manipulation over a wide temperature range has promising applications in microelectronic heat dissipation, inkjet printing, and high temperature microfluidic system. However, the fabrication of a platform for controllable droplet manipulation using the methods commonly used in industry remai...
Due to undercutting of the isotropic Cu wet etching, we must consider etch compensations on the mask design, meaning that, for example, a winding gap (Gw) of 94 μm requires a mask design width of 40 μm (Figure 5c). Because of the isotropic etching profile, the pitch between ...
In its original sense, nanotechnology refers to the projected ability to con- struct items from the bottom up, using techniques and tools being developed today to make complete, high-performance products. As nanotechnology became an accepted concept, the meaning of the word shifted to encompass ...
Even more importantly, the use of a high voltage increases the chance of spark generation in a system. Therefore, any solvent with a low flash point would be difficult to adopt for use in needless electrospinning, meaning that most of the powerful solvents such as chloroform, tetrahydrofuran (...