电子束曝光系统ELS-F125具有以下优点: l 超高书写精度 - 5 nm 线宽精度 @125 kV - 1.7 nm 电子束直径&邻近效应小化 @125 kV l 大通量、均匀性好 - 宽视野书写:500um视场下10 nm线宽 - 高束流下电子束直径依然很小,大通量而不影响分辨率,2 nm电子束直径@1 nA l 界面用户友好 基于Windows系统的CAD和...
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