There are partial solutions, but none is simple and satisfying; this contributes to the picture of electron-beam lithography as a marginal technique for IC manufacturing.Gilles R. AmblardLaurent A. GuerinFrederi
PROBLEM TO BE SOLVED: To provide a mask for X-ray lithography which lessens the occurrence of the misalignment of a membrane by irradiation X-ray with lapse of time.YAMASHITA HIROAKI山下 博明ADACHI YOSHINORI足立 美紀YABE HIDETAKA矢部 秀毅...