Initial surface cleaning temperature was lowered to 680 掳C with cracked disilane gas beam irradiation by electron cyclotron resonance (ECR) cell during the initial cleaning.doi:10.1016/0022-0248(89)90446-6Hiroyuki HirayamaToru TatsumiNaoaki Aizaki...
Density0,686 g/cm3 Flash point<10°C solubilityreacts with H2O, ctc, chloroform; soluble in EtOH, benzene formcolorless gas Specific Gravity0.686 colorcolorless gas; flammable Water Solubilitysoluble CS2, ethanol, benzene [MER06] Hydrolytic Sensitivity10: reacts extremely rapidly with moisture and ...
2.3 Appearance colourless gas with a foul odour 2.4 Chemical Properties colourless gas with a foul odour 2.5 Water Solubility soluble CS2, ethanol, benzene [MER06] 2.6 Stability Pyrophoric. Reacts violently with oxidizers and halogens.May form explosive mixtures with air.3...
On the other hand, in the nonirradiated region, growth occurs as a result of layer‐by‐layer sticking and the elimination of surface hydrogen by a fragment species generated by photolysis of gas‐phase disilane. The reaction model is consistent with properties of the grown Si film. 展开 ...
STANDARD GAS CYLINDER METHOD5. INTERFERENCE AND CROSS SENSITIVITY504030201052 1 GAS To pump240S SILANESubstance Interference ppm CoexistencePhosphine 2re lda ysetarsin o af rger epyroisdhu wcehdit.e and 20 Higher readings are given.Arsine 2st alainye arrse o pf rdoadrukc berdo.wn and ...
2 1 GAS To pump240S SILANESubstance Interference ppm CoexistencePhosphine 2re lda ysetarsin o af rger epyroisdhu wcehdit.e and 20 Higher readings are given.Arsine 2st alainye arrse o pf rdoadrukc berdo.wn and red 50 〃Disilane A Similar stain is produced. 2 〃Diborane 〃20 〃...
This suggests that atomistic local structures of a -Si:H films depend critically on source gas species. The difference in the local structures of these films is also demonstrated by the substrate temperature dependence of the electron mobility; the room-temperature electron mobility for disilane ...
Avoid breathing vapours, mist or gas. Ensure adequate ventilation. Evacuate personnel to safe areas. Avoid breathing dust. For personal protection see section 8. 6.2 Environmental precautions Prevent further leakage or spillage if safe to do so. Do not let product enter drains. Discharge into ...
Physical state : Gas Formula : F6Si2 Synonyms : SILICON FLUORIDE PERFLUORODISILANE DISILICON HEXAFLUORIDE (TRIFLUOROSILYL)TRIFLUROSILANE Chemical family : SILICON COMPOUND 1.2. Recommended use of the chemical and restrictions on use Recommended use : Chemical intermediate For research use only 1.3....
The decomposition reaction of disilane proved to be very efficient, reducing the amount of dopant gas required by about two orders of magnitude at the lower growth temperatures. Electrical measurements on disilane‐doped GaAs yield the same high mobilities as obtained in silane‐doped GaAs films, ...