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Byung Jin Cho A VERTICAL SPLIT-GATE FLASH MEMORY FEATURING HIGH-SPEED SOURCE-SIDE INJECTION PROGRAMMING, READ DISTURB FREE, AND 100K ENDURANCE FOR EMBEDDED FLASH (EFLASH) SCALING AND COMPUTING-IN-MEMORY (CIM) ...111 Tzu-Hsuan Hsu; Hang-Ting Lue; Po-Kai Hsu; Teng-Hao Yeh; Pei-Ying Du;...
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Many efforts have been made toward master fabrication using non-photolithography to reduce costs, increase speed, and ease processing, largely by avoiding the need for expensive facilities. One method is based on toner [4], and uses laser or inkjet printers to print micron-sized features of ...