The purification device comprises an etching groove, a liquid reagent tank for holding an OSP antioxidant and an effuser assembly, wherein the liquid reagent tank is positioned at the periphery of the etching tank and is communicated with the etching tank by virtue of the effuser assembly; a ...
Etching apparatus for printed circuit board The present invention relates to a printed circuit board (PCB) etching device. The PCB etching device is capable of improving product quality by removing a reservoir water effect of etching solution sprayed to the PCB. In the PCB etching... 장경...
In a method for manufacturing a semiconductor device, a barrier metal disposed on a metallic thin film for forming a thin film resistor is patterned by wet-etching. The wet-etching produces a residue of the barrier metal. The residue is ... ...
An electronic device for a portability purpose generally includes a flat type display device and a battery, and has a bar type, a folder type, and a sliding type appearance. Recently, as electronic communication technology is developed, an electronic device has been miniaturized so that a wearabl...
Device fabricationcomprises a number of process steps besides the growth of a high quality crystalline film. These steps include controlled doping of the film, selected area doping with p and n typedopants, etching, formation of ohmic and rectifying contacts, deposition ofdielectricfilms, andpassivati...
The first one concerns a new prototype device with a higher precision manufacturing process (such as silicon etching), which will be used instead of conventional milling (the current prototype manufacturing precision is not enough) to reduce the negative influence of manufacturing errors on magnetic ...
To securely clean dirty material deposited on ends of board electrical- test probes used in a board test device for executing tests including an incircuit test by a cleaning job executed once, the extreme ends of the contact pins of the board electrical-test probes are pierced through an elast...
The surface leakage current depends on the etching process parameters, postetch cleaning, and surface passivation. The need for high-quality sidewalls led to the development of effective pixel isolation technique using dry etching with inductively coupled plasma (ICP) systems as reported by groups ...
for tin-plated devices. allegromicro.com allegromicro.com 这是参考工业标准 JESD97 对锡镀器件的二级互联(设备到PCB)连接的规定。 zh.allegromicro.com zh.allegromicro.com The very good mechanical properties lead to stablemoldedcomposite parts with extremely smooth Class A surfaces which, in addition ...
The method of fabricating the solid imaging device comprises etching a plate means, wherein the plate means is optically transparent and physically rigid, and eliminating a portion of said plate means corresponding to a pad portion by sandblasting, matching and attaching the boundary of the etched...