A modified magnetron sputtering setup was used to fabricate planar nanowire (NW) arrays of Co. The structural characterization of these polycrystalline Co NW arrays confirms the coexistence of both hcp and fcc phases, in which their relative fractions depend on the Co deposition time as well as ...
By comparing the sputtering times up to the film/substrate interface, it was found that an oxidation reaction also occurred on the right-hand side of the BPE because aluminum and oxygen were detected in the outer part of each specimen (Fig. 3a and b). Although the position of the interface...
Plasma damage-free sputtering of indium tin oxide cathode layers for top-emitting organic light-emitting diodes. Appl Phys Lett 2005; 86: 183503. 12 Deppe DG, Lei C, Lin CC, Huffaker DL. Spontaneous emission from planar microstructures. J Mod Opt 1994; 41: 325–344. 13 Becker H, Burns...
A Ta bottom layer and perpendicularly magnetized Co/Pt film is deposited on a sapphire substrate by using a magnetron sputtering system. The film structure consists of the following layers from bottom to top: Ta 200/Pt 50/(Co 14.3/Pt 6) ×5. Thicknesses are given in angstroms. The Co/Pt...
Owners of Blue Knob are still sputtering along... did they make any off season improvements? Like, any? Their facebook page does a fantastic job of pushing the Clubhouse Surf and Turf specials...camp October 4, 2020 Member since 01/30/2005 🔗 660 posts RodneyBD wrote: Their face...
Technics Hummer II Sputtering System #HU-II BRUKER BSFU-36 TYP: H9374 VOLT 230 HZ 50/60 AMP 2.7 PHASE 1 BRUKER BSFU-0 SLAVE TYP: H9638 VAR. 0 VOLT 230 HZ 50/60 AMP 1.6 PHASE 1 DCAB Illumina PCB Main CCA Processor Circuit Board Assy No. 173500 ...
316L SS;sputtering;niobium films;wear resistance 1. Introduction With advancements in various medical fields and the subsequent rise in life expectancy, the demand for innovative biomaterials has become paramount [1]. For instance, the number of hip and knee replacement surgeries continues to rise si...
Figure 2h shows the metal Au pad fabrication, where a layer of Au was deposited to connect the PMUT to the external PCB; metal sputtering was performed directly on the wafer, sputtering 20 nm Cr and 100 nm Au, and the pattern was formed by plasma etching. The bottom cavity preparation ...
THz Laser Beam Profiling by Homogeneous Photodoping of High Resistivity Silicon in a Compact Single-Pixel Detection Setup A 270 nm thick indium-tin-oxide thin film deposited on glass by radio-frequency magnetron sputtering is used as dichroic mirror, such that the NIR ... F Garoi,C Udrea,C...
The successful applicant will help setup, calibrate, and operate tools for MLO production, including:成功申请者将帮助设置、校准和操作MLO生产工具,包括: Photolithography equipment光刻设备 Sputtering system溅射系统 Etching and plating stations蚀刻和电镀 Flying probe tester飞针测试仪 Applicant will be...