SC phase diagramA series of c-axis oriented electron-doped high- T c superconducting La 2 xCe xCuO 4 thin films, from heavily underdoped x = 0.06 to heavily overdoped x = 0.19, have been synthesized by dc magnetron sputtering technique on (1 0 0) SrTiO 3 substrates. The influence of...
A schematic diagram of the apparatus used in this work is shown in Fig. 1. Download: Download full-size image Fig. 1. Experimental setup of magnetron sputtering. To evade/reduce contamination of a growing film, silicon (111) and quartz substrates were ultrasonically cleaned in acetone/...
Using unbalanced DC magnetron sputtering, coatings of ZrN-ZrOxNy and ZrO2-ZrOxNy-316L with cubic crystalline structures and preferential in-plane growth (222) and (111), respectively, were deposited onto stainless steel. The depth profile of the composition of the coating indicates that it is oxi...
Ti sputtering current, ITi (A) 0.4, 0.6, 0.8, and 1.0 Deposition time (min) 60 Figure 1 Open in figure viewerPowerPoint Schematic diagram of DC unbalanced magnetron cosputtering system. 2.2. Characterization The chemical composition and chemical states of TiCrN films were investigated by X-ray...
Fig.2Thediagramofband-gapandoxygenvacancy energylevelsforTiO 2 films 位能级。 图1的结果还表明,氧气分压的变化,基本上不改变二 氧化钛薄膜的带隙宽度,它只能改变带隙中的氧缺位能级。 因此,用溅射法制备二氧化钛薄膜时,氧气分压是一个重要 参数。 3结论 (1)在不同氧气分压下,用直流反应磁控溅射法制备了 ...
coatings Article Correlation Between Stoichiometry of NbxNy Coatings Produced by DC Magnetron Sputtering with Electrical Conductivity and the Hall Coefficient Angélica Garzon-Fontecha 1, Harvi A. Castillo 2, Daniel Escobar-Rincón 3 , Elisabeth Restrepo-Parra 3,* and Wencel de la Cruz 2 1 Centro ...
coatings Article Structural, Morphologic, and Ferroelectric Properties of PZT Films Deposited through Layer-by-Layer Reactive DC Magnetron Sputtering Benas Beklešovas 1,*, Aleksandras Iljinas 1, Vytautas Stankus 1, Jurgita Cˇ yviene˙ 1, Mindaugas Andrulevicˇius 2 , Maksim Ivanov 3 and Ju...
Fig.8 Working principle diagram of sacrificial anode protection method 目前提高镁牺牲阳极使用寿命的方法主要是合 金化处理。晶粒尺寸和第二相的组成会对镁牺牲阳 极的电流效率和腐蚀均匀性产生影响,而合金化处 理会对晶粒尺寸和第二相造成影响。Wen 等[98]在 Al...
FIG. 1 is a circuit diagram of one overall system according to the present invention. FIG. 2a is a schematic diagram of the basic components of a prior art switch mode DC plasma processing system. FIG. 2b is a schematic diagram of the basic components of a switch mode DC plasma processin...
Fig.22 Magnetron sputtering schematic 超声滚挤压作为一种新兴的塑性成形技术, 将静压力与超声振动技术相结合, 其原理与超声振动滚压加工类似, 可以有效提高材料的表层性能, 对提高轴承的力学性能和表面质量具有指导意义。超声滚挤压碾平轴...