About Cymer Cymer is a supplier of deep ultraviolet (DUV) laser illumination sources, the essential light source for DUV photolithography systems. DUV lithography is a key enabling technology, which has allowed the semiconductor industry to meet the exacting specifications and manufacturing requirements ...
Cymer has proved the feasibility of its device and minimized its risks by using some central functions from tried DUV technologies. "The biggest challenges come from all the different core competencies being put into place as a group," he said. "How are they going to evolve over the next 12...
Also Thursday, Marc Corthout, president of Xtreme Technologies GmbH, said the company has achieved 37W average power at 100 percent duty cycle with its laser-assisted discharge produced plasma source. Corthout said module-level testing of the various components of the source have proven operation ...
Whether you require a gas mixture for semiconductor, medical or industrial laser applications you will find that Nova Gas can meet your needs. Nova Gas Technologies, Inc. was founded in 1964 as Cryogenic Rare Gas Laboratories, Inc. to import, purify and resell the rare gases: Krypton, Neon,...
A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output co
Cymer Laser Technologies (San Diego, CA) Primary Class: 372/14 Other Classes: 372/9, 372/107, 372/108, 372/109 International Classes: G02B26/08;B23K26/42;G02B26/04;H01S3/00;H01S3/101; (IPC1-7): H01S3/121 Field of Search: ...
A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source and method of operating same is disclosed which may comprise an EUV plasma production chamber having a chamb
Hansson, et al., “Xenon liquid jet laser-plasma source for EUV lithography,” Emerging Lithographic Technologies IV, Proc. of SPIE, vol. 3997:729-732 (2000). Hercher, “Tunable single mode operation of gas lasers using intracavity tilted etalons,” Applied Optics, vol. 8, No. 6, Jun....
An EUV light source is disclosed that may include a laser source, e.g. CO2 laser, a plasma chamber, and a beam delivery system for passing a laser beam from the laser sou
An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a c