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CU ECP PLANARIZATION BY INSERTION OF POLYMER TREAT 优质文献 相似文献 参考文献 引证文献An optimization of tungsten plug chemical mechanical polishing (CMP) using different consumables The continuous shrinkage of integrated circuit devices provides the advantage of having more electrical functions on the smal...
A seal assembly 1 described comprises an elastomeric component 10 having a sealing surface 25 for providing a sealing function, and an energising band 30, the elastomeric component 10 including an aperture for the energising band, wherein the energising band is adapted to fit in the aperture of...