必应词典为您提供Cleaning-solution的释义,un. 洗涤液;洗液;清洁液; 网络释义: 清洗液;去墨清洗液;清洗溶液;
One solution contains one part ammonium hydroxide, two parts hydrogen peroxide, and 300-600 parts deionized water together with a trace of high purity surfactant. Rinsing water is flowed through the tank after the first solution is dumped. A second solutions contains highly dilute hydrofluoric acid...
The cleaning solution comprises a potassium hydroxide (KOH) solution for cleaning off slurry remaining on the surface of the polishing pad, and a hydrogen peroxide (H 2 O 2 ) solution and ammonia water (NH 4 OH) solution for removing abrasive debris remaining on the surface of the polishing...
Nitric acid-hydrogen peroxide cleaning solution information, including chemical properties, structure, melting point, boiling point, density, formula, molecular weight, uses, prices, suppliers, SDS and more, available at Chemicalbook.
It is used to prepare a cleaning solution of semiconductor, and cleaning method is arranged to improve cleaning effect after a kind of after the etching by using a metal layer of cleaning solution tests and the content by increasing sulfuric acid and hydrogen peroxide forms a vertical cross sect...
网络氢氟酸过氧化氢混合洗涤液 网络释义 1. 氢氟酸过氧化氢混合洗涤液 ...hydrofluoric acid hydrogen peroxide mixture cleaning solution氢氟酸过氧化氢混合洗涤液hydrogen blistering 氢泡伤 ... www.zftrans.com|基于18个网页
A cleaning solution or detergent is blend composed from a number of components or more precisely, from water as a solvent with: • Surfactants, • Alkaline agents, • Acid agents, and • Chelating (sequestering) agents. Surfactants are usually organic compounds with amphipolar nature, i....
are provided and include from about 0.08 to about 0.1 percent by weight of hydrogen fluoride; from about 0.5 to about 0.6 percent by weight of ammonium fluoride; from about 24.9 to about 49.7 percent by weight of hydrogen peroxide; and from about 49.6 to about 74.5 percent by weight of ...
of gas/vapor Electric hot plate or commercial vaporizer is needed to depolymerize the powder form or vaporize a formalin solution Off-gassing from a concentrated solution of ClO2 or by passing chlorine gas through sodium chlorite Generator needed to flash vaporize a 35% hydrogen peroxide solution ...
We found that the dipping treatment in hydrogen fluoride (HF) solution d... M Kubo,M Hidaka,M Kageyama,... - 《Materials Science Forum》 被引量: 1发表: 2012年 Immersion cleaning e.g. of silicon wafer using hydrochloric acid and hydrogen peroxide mixture Immersion cleaning e.g. of ...