Plasma process induced damage (PID) to thin gate oxide of different thickness was investigated in this paper with antenna test structures to enhance the effect of plasma charging. Gate leakage under Fowler-Nordheim (F-N) stress, threshold voltage, and time dependent dielectric breakdown (TDDB) was...
Chin-Shui-Yeh网络叶金水网络释义 1. 叶金水 叶金水(Chin-Shui Yeh); 林庆雄(Ching-Hsiung Lin) ; 陈正雄(Cheng-Hsiung Chen) ; 林国川(Kwo-Chuan Lin) 繁体中文 慢…www.airitilibrary.com|基于12个网页© 2024 Microsoft 隐私声明和 Cookie 法律声明 广告 帮助 反馈...