This book will help chemists and non-chemists alike understand the fundamentals of surface chemistry and precursor design, and how these precursors drive the processes of atomic layer deposition, and how the surface-precursor interaction governs atomic l
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Atomic layer deposition (ALD), a chemical vapor deposition technique based on sequential self-terminating gas–solid reactions, has for about four decades been applied for manufacturing conformal inorganic material layers with thickness down to the nanometer range. Despite the numerous successful applicatio...
Leskelä, M, Ritala, M (2003) Atomic layer deposition chemistry: recent developments and future challenges. Angew Chem Int Ed 42: pp. 5548-5554Leskela, M., Ritala, M.: Atomic layer deposition chemistry: recent developments and future challenges. Angew. Chem. Int. Ed. 42 , 5548–5554...
For further progress in atomic layer level controlled materials processing well understood surface chemistry is of major importance.doi:10.1016/0169-4332(96)00306-6Tuomo SuntolaAppl.surfT. Suntola, " Surface Chemistry of Materials Deposition at Atomic Layer Level " Appl. Surf. Sci. 100/101, 391...
Abstract ( 5 ) PDF (7059KB) ( 2 ) The society's urgent demand for environmentally friendly, safe and low-cost energy storage devices has promoted the research of aqueous zinc-ion batteries. However, the uneven deposition of Zn ions on anodes will lead to the growth of the dendrite and...
Area-selective atomic layer deposition on 2D monolayer lateral superlattices Area selective atomic layer deposition (AS-ALD) has been recently proposed as a controlled growth method, but the patterning resolution and selectivity require improvements. Here, the authors report a superlattice-based AS-ALD ...
Lee, Y.-H. et al. Synthesis of large-area MoS2 atomic layers with chemical vapor deposition.Adv. Mater.24, 2320–2325 (2012). ArticleCASPubMedGoogle Scholar Salmeron, M., Somorjai, G. A. & Chianelli R. R. A LEED-AES study of the structure of sulfur monolayers on the Mo(100) crys...
fabricated with an area-selective atomic layer deposition (ALD) method. The shell thickness can be precisely controlled by varying the ALD cycles. A monolayer Pt shell shows optimal selectivity and reactivity towards the preferential oxidation of CO under an atmosphere of H2(PROX), correlated with ...
Meanwhile, the as-formed SnO2/Sn/LixSn gradient buffer layer with low electronic conductivity success-fully protects the LATP electrolyte surface from erosion by the Li metal anode. Additionally, the LixSn alloy formed at the Li surface can effectively regulate uniform lithium deposition and ...