Synthesis of aligned carbon nanotube and their growth mechanism by chemical vapour deposition method 化学气相沉积法制备定向碳纳米管及其生长机理的研究 service.ilib.cn 8. The investigations of membrane structure and process of chemical vapour deposition of carbonyl metals 羰基金属气相沉积工艺条件及膜结构研...
In a CVD method, a wafer (3) is retained on a wafer holder (2) in a reaction tank or chamber (1) to be put under reduced pressure. At least one through hole is made in an insulating film formed on a substrate of the wafer (3) and a first metallic film is formed in the ...
Chemical vapour deposition (CVD) is a powerful technology for producing high-quality solid thin films and coatings. Although widely used in modern industries, it is continuously being developed as it is adapted to new materials. Today, CVD synthesis is being pushed to new heights with the precise...
Chemical Vapour Deposition System 再放入微波电浆气相沈积系统 hot-filament chemical vapour deposition 热丝化学气相沉积 Plasma Chemical Vapour Deposition-PCVD 等离子化学气相沉积 plasma arc 等离子弧, 等离子体电弧; 电浆弧 plasma spraying 等离子喷涂 plasma cutting 等离子切割 inductively coupled plasma 电感耦合...
chemical vapour deposition 英[ˈkemikəl ˈveipə ˌdepəˈzɪʃən] 美[ˈkɛmɪkəl ˈvepɚ ˌdɛpəˈzɪʃən] 释义 化学汽相淀积 实用场景例句 全部 The vapour generator for chemical vapour deposition plants allows the extraction of vapours. 用于化学...
C3N4 thin films have been prepared on Pt substrates by microwave plasma chemical vapor deposition (MPCVD) method. 采用微波等离子体化学气相沉积法(MPCVD),使用高纯N2(99。 更多例句>> 3) microwave plasma chemical vapor deposition 微波等离子体化学气相沉积 ...
deposition n. 1.[U]沉积 2.[C]沉积物 3.[U]罢免 4.[C]证词 vapour n.[C,U]蒸气,潮气,雾气 chemical adj. 1.与化学有关的,化学的 2.用化学方法制造的,化学作用的 n. 化学制品,化学品 vapo(u)r deposition 蒸法镀敷 vapour ize v. 蒸发 vapour nozzle 蒸汽喷嘴 vapour cooling 蒸发冷...
chemical vapour deposition
作者:Yan, Xiu-Tian; Xu, Yongdong; 出版年:2012-5 页数:341 定价:$ 224.87 ISBN:9781447125501 豆瓣评分 目前无人评价 评价: 写笔记 写书评 加入购书单 分享到 推荐 内容简介· ··· "Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials" focuses on the application of th...
L. Choy, Chemical vapour deposition of coatings, Prog. Mater. Sci. 48(2) (2003) 57–170. CVD offers the deposition of highly pure materials with accurate control at the nanometric range. Moreover, it can use a large list of chemical precursors, including organometallic compounds, halides, ...