中文名称:球形微米氧化硅英文名称:Silicon Dioxide CAS:14808-60-7品牌:罗飞纳米 保存条件:密封保存于干燥、阴凉的环境中纯度规格:99.9% 产品类别:氧化物粉体 二氧化硅(SiO2) 是否进口:否产品规格:产品型号较多,详细请咨询 是否危险化学品:否货号:产品型号较多,详细请咨询 ...
外文名 silicon dioxide 别 名 硅石 化学式 SiO2 分子量 60.084 CAS号 14808-60-7 EINECS 215-684-8 密度2.2 沸点2230 外 观 白色粉末 溶解性 不溶于水 用途: 1.氧化硅用于制造平板玻璃,玻璃制品,铸造砂,玻璃纤维,陶瓷彩釉,防锈用喷砂,过滤用砂,熔剂,耐火材料以及制造轻量气泡混凝土。
silicone dioxide Purity 99.8% Other attributes Place of Origin Jiangxi, China Type Carbon Black Usage Coating Auxiliary Agents, Rubber Auxiliary Agents Classification Chemical Auxiliary Agent Brand Name Hungpai Model Number HP-200 Color: White Specific area 200±25 Application 2: "Plastic Film,Hotness...
Chemical vapor deposition (CVD) of silicon dioxide films using oxygen-silicon source reactants and a free radical promoter... HE O'Neal,MA Ring,JG Martin - US 被引量: 55发表: 1997年 Low‐temperature deposition of silicon dioxide films from electron cyclotron resonant microwave plasmas Silicon ...
摘要: PROBLEM TO BE SOLVED: To provide a method of low temperature chemical vapor growth for the growth of a silicon dioxide film on a substrate material.收藏 引用 批量引用 报错 分享 文库来源 求助全文 Chemical vapor deposition of silicon dioxide 优质文献 相似...
Silicon dioxide thin films were prepared by a low‐temperature atmospheric‐pressure chemical vapor deposition method. The raw materials were tetrakis(diethylamino)silane and ozone in oxygen gas. The amorphous films were obtained at a substrate temperature above 200°C. The films were superior in chem...
Silicon Dioxide SiO2 NAME:SilicondioxideChemicalformula:SiO2Molecularweight:60.084CAS14808-60-7Density(indoortemperature):2.2g/cm3Meltingpoint:1650(±50)℃Boilingpoint:2230℃Solubility:0.012g/100ml(Inwater)Silicaisusedforman Sodium Fluoride NaF SodiumFluoride ChemicalformulaNaFmolecularweight41.99CAS7681-49-4...
Silicon dioxide(molecular formula: SiO2 or O2Si) is an oxide of silicon with the chemical formula SiO2 most commonly found in nature as quartz. solated on dark background. 3D illustration.,站酷海洛,一站式正版视觉内容平台,站酷旗下品牌.授权内容包含正版商
The present invention provides an aqueous composition useful for polishing silica and silicon nitride on a semiconductor wafer comprising by weight percent 0.01 to 5 carboxylic acid polymer, 0.02 to 6 abrasive, 0.01 to 10 polyvinylpyrrolidone, 0.005 to 5 cationic compound, 0.005 to 5 zwitterionic co...
Chemical Products CAS 14808-60-7 Powder Silicon DioxideProduct Description {Product Name}: Silicon Dioxide {Test Method.}: HPLC {Appearance}: White Powder {Specification}: 99% {MOQ}: 1kgHow to make order & payment?PI will send to you.We can accept payment by Bank T/T,Western...