A good mixing of reactants is important for non-premixed combustion in miniature combustors. In this paper, mixings of methane and oxygen in Y-shaped mesoscale combustors with and without porous media were compared numerically. The results show that when there is no porous media in the ...
atmo spheric pressure.T he reac tor was loaded with 2 0 0 mg of th e prepar ed catalyst .P rior to the reac tion,the c atalysts were reduc ed in a H 2 gas fl ow of 2 0 mL /min at 7 0 0 。C fo r 4 h .T he reactant gas f eed con sisted of 5 0 % C H4...
S Karra,D Gutman,S Senkan - 《Combustion Science & Technology》 被引量: 162发表: 1988年 Fabrication of NiFe thin film elements by dry etching using CH4/H2/O2 A mixture of methane, hydrogen, and oxygen has been used to etch thin films of NiFe. The variation of etch rate with concentrati...
To calculate the limiting reagent, enter an equation of a chemical reaction and press the Start button. The reactants and products, along with their coefficients will appear above. Enter any known value for each reactant. The limiting reagent will be highlighted in red....
Density functional theory in its B3LYP variant has been used to explore quantitative details of the adiabatic potential energy surface leading from Ni+ + C3H8 reactants through a deep Ni+(C3H8) well to NiC2H4+ + CH4 and NiC3H6+ + H2 elim... SS Yi,MRA Blomberg,PEM Siegbahn,... - 《...
Balance CH4N2O + H2SO4 = CH4N2S + H2O + O2 by inspection or trial and error with steps. Step 1: Count the number of each element on the left and right hand sides Reactants (Left Hand Side)Products (Right Hand Side) CH4N2OH2SO4TotalCH4N2SH2OO2Total ...
Reactants, stable intermediates, and products were determined spatially by chemical sampling and gas-chrom... FL Dryer,I Glassman - 《Symposium on Combustion》 被引量: 415发表: 1973年 Acetylene Oxidation in a JSR From 1 to 10 Atm and Comprehensive Kinetic Modeling Acetylene oxidation in a jet...
Several investigations have been performed on the etching of Ru thin films using O2/Ar, O2/Cl2 and O2/CF4 gas mixtures [6], [13], [14], [15], [16]; Ru films are known to react with O2 containing plasma, resulting in the formation of volatile RuO3 and RuO4. Halogen gases such ...
htnealrsyeuzarecfdtaicotehneaannddidsssthohoceiwagtaidose-nlsaeryneesadicntdgioertneasacchotmfioOenns2t., Methods Fabrication of sensor structures. The Au patterned substrates were installed on the inside wall of the arc-discharge chamber; the substrate were then coated with SWCNTs, as ...
To calculate the limiting reagent, enter an equation of a chemical reaction and press the Start button. The reactants and products, along with their coefficients will appear above. Enter any known value for each reactant. The limiting reagent will be highlighted in red. Theoretical yields of ...