先进MEMS ,功率器件和封装中的应用驱动了对先进的150mm和200mm CVD技术的需求。为满足这些技术的制造要求,需要超厚...
Centura DxZ CVD 反應室採用了非消耗型電阻加熱器和陶瓷部件,可顯著改善成本、產能、易維護性和可靠性。DxZ 製程套件也由零消耗部件組成。借助單晶圓多反應室架構,Centura DxZ 可提供高達 100WPH(3,000Å PE TEOS 和矽烷電漿)和 55wph (3000Å SACVD USG) 的產能。對稱式設計和小反應室容量,對於沉積和清潔...
0010-09035 (001009035) ASSY BWCVD THROTTLE VALVE 100,125 &150MM 0010-09088 (001009088) ROBOT CALIBRATION MOUSE 0010-09133 (001009133) Susceptor 150MM silane 0010-09340 (001009340) susceptor lift ass`y 0010-09341 (001009341) wafer lift ass`y 0010-09348 (001009348) universal throttle valv...
●SMIF : Non SMIF ●Monitor : 2ea(1 TTW, 1 Stand Alone)●AC Rack/System Controller : VME 3. Gas Delivery ●MFC Type : STEC 7330 ●Single Line Drop ●Gas Panel Door : Safety Wire Glass 4. Process Chamber : 3Chamber(A,B,C)●Process : PE CVD,TEOS(USG,FSG capable)●Applications :...
Process Chamber : 3Chamber(A,B,C) Process : PE CVD,TEOS(USG,FSG capable) Applications : IMD Heater : ALN Ceramic ( end-user told ,not checked by inspector ) Cleaning Method : Conventional (No Microwave/RPS) RF Generator : AE 2K2V(2000W, 13.56MHz) ...
Centura™DXZ CVD Applications in the advancedCMOSandMtMsegments are driving the need for advanced 150mm and 200mmCVDtechnology. Ultra-thick oxides (≥20µm); low-temperature processing (<200°C); conformal, low wet-etch-rate films; anddopedfilms with tunable refractive indices are needed to...