Argon-boron double implantation in silicon : Gao Lu-Quan, Zhu Jin-Liang, Cai Ren-Keng and Jiang Xin-Yuan. Vacuum 39(2–4), 195 (1989) Author links open overlay panelShow more Add to Mendeley Share Cite https://doi.org/10.1016/0026-2714(90)90139-EGet rights and content...
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Argon-boron double implantation in silicon : Gao Lu-Quan, Zhu Jin-Liang, Cai Ren-Keng and Jiang Xin-Yuan . Vacuum 39 (2–4), 195 (1989)doi:10.1016/0026-2714(90)90139-EMicroelectronics Reliability