型号AZ 5214E AZ 5214E 正/负可改变型光刻胶具有高解像度图形反转正/负可改变型光刻胶,特别为lift-off工艺优化 AZ光刻胶刻蚀厚度从1μm到150μm以及更厚。 AZ光刻胶特点: 适用于高分辨率工艺(lift-off工艺) 适用于正/负图形 很宽的膜厚范围
光刻胶chihamaogasashizuokadaitoetd AZElectronicMaterials(Japan)K.K. STANDARDNO.ETD−TS−SF−B0511REVISEDNO.fPAGE(S)01/05 MAIN TITLEMATERIALSAFETYDATASHEET STANDARD NAME SUB- AZ5214−ETITLE ESTABLISHEDDATEAPPROVEDBYCHECKEDBYPREPAREDBY 2004.10.01S.YAMAMOTOH.WAKAMATSUS.MATSUSHITA 1.COMPANYIDENTIFICA...
光刻胶chihamaogasashizuokadaitoetd AZElectronicMaterials(Japan)K.K. STANDARDNO.ETD−TS−SF−B0511REVISEDNO.fPAGE(S)01/05 MAIN TITLEMATERIALSAFETYDATASHEET STANDARD NAME SUB- AZ5214−ETITLE ESTABLISHEDDATEAPPROVEDBYCHECKEDBYPREPAREDBY 2004.10.01S.YAMAMOTOH.WAKAMATSUS.MATSUSHITA 1.COMPANYIDENTIFICA...