AZ ® nLOF ® 2000 Series Negative Tone i-Line Photoresist for Metal Lift-Off Applications AZ nLOF 2000 Series Summary
None • Expose: 365nm sensitive • Post Expose Bake: 90ºC/60s • Develop: Puddle, spray or immersion • Developer Type: MIF * PEB is required for proper imaging SPIN CURVES (150MM SILICON) AZ ® 12XT -20PL Series Chemically Amplified Positive Tone Photoresists