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nanomaterials Article Characteristics of Hf0.5Zr0.5O2 Thin Films Prepared by Direct and Remote Plasma Atomic Layer Deposition for Application to Ferroelectric Memory Da Hee Hong 1, Jae Hoon Yoo 1, Won Ji Park 1, So Won Kim 1 , Jong Hwan Kim 1,2, Sae Hoon Uhm 2 and Hee Chul Lee 1,*...