It provides atomic mass, mass excess, nuclear binding energy, nucleon separation energies, Q-values, and nucleon residual interaction parameters for atomic nuclei of the isotope B-19 (Boron, atomic number Z = 5, mass number A = 19). Landolt-Brnstein Homepage Introduction Index...
Many important properties of an isotope depend on its mass. The total number of neutrons and protons (symbol A), or mass number, of the nucleus gives approximately the mass measured on the so-called atomic-mass-unit (amu) scale. The numerical difference between the actual measured mass of ...
Fresenius' Journal of Analytical ChemistryNyomora A.M.S., Sah R.N., and Brown P.H., 1997 Boron determination in biological materials by inductively coupled plasma atomic emission and mass spectrometry: effects of sample dissolution methods. Fresenius J. Anal. Chem. 357 : 1185–1191....
The concentrating mirror is one half of a giant inflatable balloon, the other half is transparent (so it has an attractive low mass). The advantage is that you have power as long as the sun shines and your power plant has zero mass (as far as the spacecraft mass is concerned). The ...
Alpha : (kg/kW) power plant mass in kilograms divided by kilowatts of power. So if a solar power array had an alpha of 90, and you needed 150 kilowatts of output, the array would mass 90 * 150 = 13,500 kg or 13.5 metric tons Specific Power : (W/kg) watts of power divided by...
STANDARD ATOMIC MASSES 1979 ( Scaled to the relative atomic mass ,Actinium, NameAmericium, AluminiumArgon, AntimonyAstatine, ArsenicBerkelium, BariumBismuth, BerylliumBromine, BoronCaesium, CadmiumCalifornium, CalciumCerium, Carbon
Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materialsdoi:AS ISO 14237-2006采用ISO 14237:2000规定了一种二次离子质谱法,用于测定单晶硅中的硼原子浓度,该方法使用均匀掺杂材料,该材料由植入硼的认证标准物质校准....
Surface chemical analysis — Secondary-ion mass spectrometry — Determination of boron atomic concentration in silicon using uniformly doped materialsdoi:ISO 14237:2010ISO 14237:2010规定了一种二次离子质谱法,用于使用均匀掺杂材料测定单晶硅中的硼原子浓度,该材料由植入硼的认证参考材料校准.该方法适用于浓度...
Surface chemical analysis — Secondary-ion mass spectrometry — Determination of boron atomic concentration in silicon using uniformly doped materialsSurface chemical analysis -- Secondary- ion mass spectrometry -- Determination of boron atomic concentration in silicon using uniformly doped materials...
Therefore, the understanding of ion beam mixing is not only crucial for the optimization of semiconductor processing, but also for the evaluation of the depth resolution of state-of-the-art sputtering techniques like, e.g., secondary ion mass spectrometry. Over the past decades ion beam mixing ...