Our atomic layer deposition tools give you ultimate precision and uniformity for coatings at even the finest nodes. BibliographyPhoenix – Batch Production ALD The field-proven, semi-automated batch Phoenix® system delivers uncompromised performance for mid-scale batch production. Read more Savannah...
The Arradiance GEMStar XT-P plasma-enhanced atomic layer deposition (ALD) system was installed at MIT.nano in May Learn More > Ecoresorbable and bioresorbable MEMS using ALD The 20 nm SiO2 encapsulation layer in this research was deposited using a GEMStar XT-P, a plasma enabled atomic layer ...
薄膜均匀性:传统方法如 PECVD(等离子体增强化学气相沉积)或 PVD(物理气相沉积)在高深宽比结构中沉积不均匀,ALD 能在微纳米尺度结构中实现均匀沉积。 刻蚀精度:ALD 的对标工艺 ALE(原子层刻蚀)同样依赖自限性反应,具备更高的刻蚀均匀性和精度。 成本与效...
Atomic layer deposition (ALD) offers exceptional precision in thin-film growth. The sequential, self-limiting chemical reactions between gaseous precursors and a substrate, with each cycle depositing a single atomic layer offers precision, conformality and uniform deposition. ...
科睿设备有限公司供应原子层沉积系统(Atomic Layer Deposition System)供应产品,产品特性1.系统含有两个腔体:真空腔和沉积反应腔。有效地防止温度和真空度的泄漏,保持稳定的沉积反应条件,成膜均一细致无漏点。这是其他只有单一腔体设备所不能达到的。沉积腔与真空腔分开,沉
Atomic Layer Deposition System: Savannah® With over 300 systems installed worldwide, our Savannah® series is the standard for ALD research and development. The Savannah® combines ease of use and great experimental flexibility into a compact, inexpensive package. Our Savannah® series is the...
Oxford Instruments’ ALD product family offers a unique range of flexibility and capability in the engineering of nanoscale structures and devices by combining remote plasma ALD processes with thermal ALD.Products The FlexAL atomic layer deposition (ALD) system offers a broad range of optimised high-...
The PlasmaPro ASP high-rate atomic layer deposition (ALD) research system from Oxford Instruments is designed for quantum technology and advanced R&am
Low damage, uniform deposition ALD passivation, gate dielectric by Al2O3films Increased throughput and improved uniformity to bring remote plasma ALD to production. Image Credit: Oxford Instruments Plasma Technology Plasma Revolutionary plasma source: Atomfab makes use of a patent-pending remote source...
ALD processes Continued progress has been achieved with ALD, demonstrating the capability to use this technique to deposit a variety of materials. Corial D250 Deposition system with the capability to operate in PECVD and ALD modes in the same reactor ...