The air inside a cleanroom is filtered and recirculated continuously, and employees wear special clothing (sometimes called ‘bunny suits’) to help keep the air particle free. ASML machines are also made in cleanrooms inside our EUV and DUV factories inVeldhoven, the Netherlands. Learn more ab...
The air inside a cleanroom is filtered and recirculated continuously, and employees wear special clothing (sometimes called ‘bunny suits’) to help keep the air particle free. ASML machines are also made in cleanrooms inside our EUV and DUV factories inVeldhoven, the Netherlands. Learn more ab...
ANAFLASH and Legato Logic Merge Forces BySally Ward-Foxton04.11.2025 Welcome to AI with Sally, the EE Times podcast where I explore the cutting edge of AI chips with industry leaders. Today's episode is sponsored by Anaflash, the Silicon Valley startup making waves with its AI microcontroller...
ASML Holding NV engages in the development, production, marketing, sales, upgrading and servicing of advanced semiconductor equipment systems. It includes lithography, metrology and inspection systems. The company was founded on April 1, 1984 and is headquartered in Veldhoven, the Netherlands. Competitor...
Using an appropriate filter, the said undiffracted light can be filtered out of the reflected beam, leaving only the diffracted light behind; in this manner, the beam becomes patterned according to the addressing pattern of the matrix-addressable surface. An alternative embodiment of a programmable...
On leaving the imprint template210, the actinic radiation202then enters imprintable medium212. The imprintable medium212may for example be silicon-based and may have a refractive index which is similar to that of the imprint template210(e.g. n=1.46). The actinic radiation202therefore does not ...
An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that...
The patterning device is moved out of the resist leaving a pattern in it after the resist is cured. The terms “radiation” and “beam” used herein encompass all types of electromagnetic radiation, including ultraviolet (UV) radiation (e.g. having a wavelength of or about 365, 355, 248...
for the reconstruction, the general form of the structure is known and some parameters are assumed from knowledge of the process by which the structure was made, leaving only a few parameters of the structure to be determined from the scatterometry data. Such a scatterometer may be configured as...
It will be appreciated that, as an alternative, the filter can filter out the diffracted light, leaving the undiffracted light to reach the substrate. An array of diffractive optical MEMS devices (micro-electromechanical system devices) can also be used in a corresponding manner. In one example...