Considering on the large-size and complex spatial surface features of the VV mock-up, the study on special dimensional metrology and alignment methods are very important and necessary. In this paper, some specia
Testing and substantiation is performed dynamically throughout the process producing accuracy to the micrometer in accordance to NEN12233 or by Averna specific focus and alignment algorithms. UV-Curing Still within the alignment environment, UV-curing of the glue is performed. This is a multi-step ...
Joint torque measurement methods are typically classified into manual and automated device-based techniques. Manual methods typically use handheld force measurement devices with torque sensors to assess passive joint resistance during isometric movements of the limbs [9,10]. This method relies on the exa...
Modern optical metrology uses precise lines and planes in space from which measurements are made. Because this method creates these features using light it has become known as optical tooling.
The above methods are mostly applicable to fabricating DSMLAs with the same structure on both sides (biconvex MLAs or double-sided concave MLAs). A strategy to fabricate high-quality concave-convex DSMLAs is still in high demand. Precision glass molding (PGM) involves replicating the mold's ...
1. A metrology tool for aligning a robot having an engagement member for engaging a semiconductor substrate carrier disposed on a tool load-port, comprising: a frame having an opening; and a removable alignment gauge member slidably received in said frame opening, said alignment gauge member havi...
5805290Method of optical metrology of unresolved pattern arrays1998-09-08Ausschnitt et al. 5783342Method and system for measurement of resist pattern1998-07-21Yamashita et al. 5766809Method for testing overlay in a semiconductor device utilizing inclined measuring mark1998-06-16Bae ...
Prior to integration with the spacecraft, the JWST optical assembly is put through rigorous launch condition environmental testing. This work reports on the metrology operations conducted to measure changes in subassembly alignment, including the primary mirror segments, the secondary mirror to its ...
The metrology of mirrors with an off-axis aspheric or freeform shape can be based on optical testing using a Computer Generated Hologram as wavefront matching element in an interferometric setup. Since the setup can be understood as optical system consisting of multiple elements with six degrees ...
Provided herein are methods and systems used for improved semiconductor manufacturing handling, and transport. Modular wafer transport and handling facilities are combined in a variety of ways deliver greater levels of flexibility, utility, efficiency, and functionality in a vacuum semiconductor processing ...